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Photo-curing POSS (polyhedral oligomeric silsesquioxane)/fluoroalkyl siloxane modified polyacrylate coating composition and application thereof

A technology of fluorocarbon-based siloxane and hydrocarbon-based siloxane, which is applied in the field of light-curing POSS/fluorocarbon-based siloxane modified polyacrylate coating compositions, and can solve the problems of unsatisfactory antifouling performance, low adhesion, Problems such as poor coating hardness

Active Publication Date: 2019-05-10
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the research found that the coating film formed by UV light curing resin alone has poor hardness, anti-fouling performance can not meet the requirements, and the adhesion is low
In addition, the photocurable resin system uses a solvent (CN 102167948 A), and unpleasant gas will be released during the coating curing and film formation process, which is not conducive to environmental protection and needs to be improved

Method used

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  • Photo-curing POSS (polyhedral oligomeric silsesquioxane)/fluoroalkyl siloxane modified polyacrylate coating composition and application thereof
  • Photo-curing POSS (polyhedral oligomeric silsesquioxane)/fluoroalkyl siloxane modified polyacrylate coating composition and application thereof
  • Photo-curing POSS (polyhedral oligomeric silsesquioxane)/fluoroalkyl siloxane modified polyacrylate coating composition and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] (1) Synthesis of polymerizable reactive fluorocarbon-based siloxane-modified acrylate monomer (FS)

[0037] In a three-necked flask equipped with a thermometer, a reflux condenser, and a stirrer, add 0.01-0.031mol of perfluoroalkylethylene (ViR f ), 200ppm platinum catalyst KP22, stirring and heating to 80°C for coordination reaction for 60min, then adding 0.01mol hydrogen-containing siloxane oligomer DH and stirring for 20min, then adding 0.01mol double-ended diacrylate and controlling the temperature Stir continuously at 80-100°C for 8 hours. After the reaction is over, decompress and remove the low boiling point. The product obtained, that is, a polymerizable reactive fluorocarbon-based siloxane-modified acrylate monomer with the structure shown in formula (1), is denoted as FS. See Table 1 for details of the raw materials and amounts used in the synthesis of FS in each embodiment.

[0038] Table 1 Synthetic raw materials and dosage of polymerizable reactive fluoro...

Embodiment 2

[0046] (1) Synthesis of polymerizable reactive fluorocarbon-based siloxane-modified acrylate monomer FS-2

[0047] The synthesis method and raw material consumption are shown in Table 1, and the structure of the product FS-2 is shown in formula (1), where M=H, X=(1)(a), y=2, A=-(CH 2 ) 2 -, R f =C 6 f 13 .

[0048] (2) Preparation of prepolymer POSS-PA-2

[0049] In a 100mL three-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, successively weigh 10g of MMA, 0.5g of the structure as shown in formula (2) R=-C 3 h 6 OOCCH=CH 2 Octacryloxypropyl POSS(T 8 -POSS-2) and with MMA+T8 -POSS-2 total mass of 1%, about 0.11g free radical initiator BPO, stir and mix, then heat up to 50°C for prepolymerization for 60min, the viscosity of the system is about 130mPa.s, then cool to room temperature 30°C About 10.5g of transparent viscous liquid was obtained in total, that is, prepolymer POSS-PA-2.

[0050] (3) Light-curing POSS / fluorocarbon-based siloxane...

Embodiment 3

[0053] (1) Synthesis of polymerizable reactive fluorocarbon-based siloxane-modified acrylate monomer FS-3

[0054] The synthesis method and raw material consumption are shown in Table 1, and the structure of FS-3 is shown in formula (1), where M=CH 3 , X=(1)(b), b=7, A=-(OC 3 h 6 ) 7 -, R f =C 6 f 13 .

[0055] (2) Preparation of prepolymer POSS-PA-3

[0056] In a 100mL three-necked flask equipped with a reflux condenser, a thermometer, and a stirrer, weigh 10g of MMA and 1.5g of MMA in sequence according to the mass ratio. 2 Octavinyl POSS(T 8 -POSS-3), stirring, heating to dissolve octavinyl POSS in MMA to form a transparent solution, and then add MMA+T 8 -POSS-3 total mass of 0.5% is about 0.06g free radical initiator AIBME, stir and mix well, then heat up to 60°C to react for 40min, the viscosity of the system is about 390mPa.s, and then cool to room temperature about 30°C to obtain The total amount is about 11.5g transparent viscous liquid, that is, the prepolym...

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PUM

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Abstract

The invention provides a photo-curing POSS (polyhedral oligomeric silsesquioxane) / fluoroalkyl siloxane modified polyacrylate coating composition which comprises a material A and a material B. The material A comprises 40-70wt% of POSS-PA (polyamide) prepolymers, 15-58.9wt% of photo-curing acrylate monomers UVAA, 1-10wt% of polymerizable reactive fluoroalkyl siloxane modified acrylate monomers FS and 0.1-5wt% of adhesive force intensifiers. The material B comprises photoinitiators accounting for 1-6wt% of the total weight of the material A. The material A and the material B are uniformly mixed,leveled at room temperature, preliminarily dried at the temperature of 50-60 DEG C and then cured under the action of UV (ultraviolet) light to prepare a POSS / fluoroalkyl siloxane modified polyacrylate coating, and an application indicates that the coating prepared by the method has good water and dirt repellent performances and good scratch resistance.

Description

technical field [0001] The invention belongs to the field of functional coatings and coatings, in particular to a light-curing POSS / fluorocarbon-based siloxane modified polyacrylate coating composition and its application. Background technique [0002] Polymethyl methacrylate (PMMA), also known as plexiglass, has high light transmission, light weight, easy coloring, easy processing, weather resistance and good electrical insulation. It can be widely used in aviation, construction, decoration, optical instruments, etc. field. However, the low glass transition temperature and poor scratch resistance of PMMA resin severely limit its application. [0003] Using cage oligomeric silsesquioxane (POSS) to hybridize PMMA resin can improve the heat resistance stability and flame retardancy of the material, increase the hardness of the material and endow the material with anti-corrosion resistance while maintaining the original performance characteristics of PMMA. Scratch performance...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D4/02C09D4/06C09D5/16
Inventor 安秋凤李卫卫王笑鸽王玉峰黄良仙薛朝华郝丽芬
Owner SHAANXI UNIV OF SCI & TECH
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