A method for photocatalytic oxidation of xylose using indium sulfide/nickel-cobalt-aluminum hydrotalcite composite film
A photoelectric catalysis, nickel-cobalt-aluminum technology, applied in electrodes, electrolysis components, electrolysis processes, etc., can solve the problems of low reaction efficiency of photogenerated electrons and holes, and achieve the effect of promoting separation, low cost and simple process
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Embodiment 1
[0031] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.36 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, which was transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive electrode cleaned with acetone and deionized water was placed vertically. Glass, sealed and reacted at 80±5°C for 8 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic indium sulfide crystals with a particle size of 50-500 nm and scattered distribution of particle size of 1-2 microns;
[0032] (2) Dissolve 1.09 parts of nickel nitrate hexahydrate, 1....
Embodiment 2
[0035] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.36 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, and transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive glass cleaned with acetone and deionized water was placed vertically The sheet was sealed and reacted at 80°C for 8 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic indium sulfide crystals with a particle size of 50-500 nanometers and sporadically distributed particle sizes of 1-2 microns;
[0036](2) Dissolve 1.09 parts of nickel nitrate hexahydrate, 1...
Embodiment 3
[0039] (1) Add 5.7 parts of citric acid monohydrate to 20 parts of deionized water, after fully dissolving, add 1 part of indium chloride, stir and dissolve to form an indium citrate complex solution. Dissolve 1.5 parts of thioacetamide in 20 parts of deionized water to form a thioacetamide solution. The thioacetamide solution was slowly added dropwise to the indium citrate complex solution under stirring to form a mixed solution, and transferred to the reaction kettle, and at the same time, a 10×30 mm FTO conductive glass cleaned with acetone and deionized water was placed vertically The sheet was sealed and reacted at 80° C. for 7 hours to obtain a conductive glass deposited with an indium sulfide film. The thickness of the indium sulfide film is 0.8-1 micron, and it is composed of cubic indium sulfide crystals with a particle size of 50-500 nanometers and sporadically distributed particle sizes of 1-2 microns;
[0040] (2) Dissolve 1.09 parts of nickel nitrate hexahydrate,...
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