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Electrode alignment method of reverse polarity AlGaInP quaternary LED chip

A technology for LED chips and LED epitaxial wafers, applied in the field of optoelectronics, can solve the problems of poor practicability in the preparation process, large chip loss, large pattern area, etc., and achieve the effect of stable light output, high degree of alignment, and small area.

Active Publication Date: 2019-07-09
SHANDONG INSPUR HUAGUANG OPTOELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At this stage, reverse polarity AlGaInP quaternary LED chips are widely used in the field of high-power red LED display screens. Reverse polarity means replacing the substrate, and replacing the GaAs substrate with large light absorption with a single crystal conductive Si substrate or sapphire substrate. Bottom, etc. After the replacement is completed, the GaAs substrate is etched away, and the corrosion barrier layer is etched to expose the heavily doped layer. Afterwards, an Au film needs to be evaporated on the heavily doped layer to form an ohmic contact, and the N-side ohmic contact layer pattern is prepared by subsequent photolithography. , in order to ensure better current spreading and higher brightness of the reverse polarity AlGaInP, the ohmic contact pattern on the N side is generally aligned with the ohmic contact pattern on the P side, because the middle part of the epitaxial layer of the reverse polarity AlGaInP quaternary LED chip is not Light transmission, current electrode alignment generally selectively corrodes the epitaxial layer in some areas when preparing N-side ohmic contact patterns. This method has uncertainty and great loss to the chip, so how to effectively align and reduce The loss of chips has become the main problem at this stage
[0005] Chinese patent document CN104518056A discloses a method for preparing a reverse-polarity AlGaInP red LED chip, which mainly involves removing the residual metal film layer on the edge of the wafer between the two steps of stripping the GaAs substrate and etching the barrier layer. It avoids the contamination of the wafer before evaporating the N-type electrode, ensures the clean surface of the chip, and avoids the problem of electrode missing in the subsequent process, which leads to downgrade and lower yield. It involves the registration mark pattern, but the area of ​​this pattern is relatively small Causes a large loss of chips and does not specify the relevant preparation process. Poor practicability

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  • Electrode alignment method of reverse polarity AlGaInP quaternary LED chip

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Embodiment 1

[0048] An electrode alignment method for a reverse polarity AlGaInP quaternary LED chip, comprising:

[0049] (1) Evaporate a layer of Au film 6 with a thickness of 0.3-0.4 μm on the P surface of the reverse polarity AlGaInP quaternary LED epitaxial wafer, and prepare the P surface ohmic contact pattern on the Au film 6 by conventional photolithography , leave two symmetrical square marks containing the ohmic contact layer of the P surface at the center of the upper and lower or left and right edges of the epitaxial wafer, with an area of ​​0.25-1mm 2 ,Such as Figure 4 As shown, the cross and X type are used for subsequent alignment, and the black area is a square mark; the reverse polarity AlGaInP quaternary LED epitaxial wafer includes a GaAs substrate 1, a barrier layer GaInP 2, and an opaque epitaxial layer from bottom to top. Doped GaAs 3, N-type AlGaInP layer 4, reverse polarity quaternary LED epitaxial layer 5; such as figure 2 shown.

[0050] Compared with other m...

Embodiment 2

[0062] The electrode alignment method of a kind of reverse polarity AlGaInP quaternary LED chip described in embodiment 1, its difference is, in step (4), comprises:

[0063] a. Paste a heat-resistant adhesive tape of the same size on the position of the N surface corresponding to the mark made in step (1); the N surface can be clearly displayed under strong light;

[0064] b. Evaporate a GeAu film with a thickness of 0.3-0.6 μm on the N surface by means of electron beam evaporation;

[0065] c. Remove the high temperature resistant tape, and the positive photoresist on the high temperature resistant tape is also removed;

[0066] d, put the whole epitaxial wafer into the etchant, corrode the epitaxial layer exposed in the region of the GeAu film, expose the N-type AlGaInP layer 4, see the mark of the ohmic contact pattern on the P surface, make the ohmic contact pattern on the N surface, make It is aligned with the P-side ohmic contact pattern. Since the N-type AlGaInP laye...

Embodiment 3

[0068] The electrode alignment method of a reverse polarity AlGaInP quaternary LED chip described in embodiment 1 or 2, the difference is that

[0069] In the step (1), a layer of AuBe film with a thickness of 0.3-0.4 μm is evaporated on the P surface of the reverse polarity AlGaInP quaternary LED epitaxial wafer.

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Abstract

The invention relates to an electrode alignment method of a reverse polarity AlGaInP quaternary LED chip. The method comprises the following steps: growing a layer of Au or AuBe film on a P surface ofan epitaxial wafer of the reverse polarity AlGaInP quaternary LED, obtaining a P-surface ohm contact pattern through a conventional photoetching method, and reserving two symmetric marks at upper andlower or left and right edge locations of the epitaxial wafer, and removing N-surface corresponding to the marks of reverse polarity AlGaInP quaternary LED chip after accomplishing bonding and substrate corroding to transparent and visible through a way of taking the photoresist or metal film as a mask according to the marks reserved at the P surface, namely, exposing the N-type AlGaInP layer; aligning the N-surface ohm contact pattern with the P-surface ohm contact pattern according to the markers. The alignment method is simpler and more practical, the alignment degree is high, the chip loss is reduced, the chip quality is improved, the operation is simple and more stable light-exiting effect can be obtained, and the method is suitable for the scale production.

Description

technical field [0001] The invention relates to an electrode alignment method of a reverse polarity AlGaInP quaternary LED chip, belonging to the field of optoelectronic technology. Background technique [0002] LED is a new light source for lighting in the 21st century. Under the same brightness, the power consumption of semiconductor lamps is only 1 / 10 of that of ordinary incandescent lamps, but the life span can be extended by 100 times. The LED device is a cold light source with high luminous efficiency, low working voltage, low power consumption, small size, flat packaging, easy to develop thin and light products, strong structure and long life. The light source itself does not contain harmful substances such as mercury and lead. No infrared and ultraviolet pollution, no pollution to the outside world during production and use. Therefore, semiconductor lamps have the characteristics of energy saving, environmental protection, and long life. Just like transistors replac...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L33/00H01L33/36
CPCH01L33/0093H01L33/36H01L2933/0016
Inventor 李晓明沈龙梅任忠祥单立英肖成峰
Owner SHANDONG INSPUR HUAGUANG OPTOELECTRONICS