Electrode alignment method of reverse polarity AlGaInP quaternary LED chip
A technology for LED chips and LED epitaxial wafers, applied in the field of optoelectronics, can solve the problems of poor practicability in the preparation process, large chip loss, large pattern area, etc., and achieve the effect of stable light output, high degree of alignment, and small area.
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Embodiment 1
[0048] An electrode alignment method for a reverse polarity AlGaInP quaternary LED chip, comprising:
[0049] (1) Evaporate a layer of Au film 6 with a thickness of 0.3-0.4 μm on the P surface of the reverse polarity AlGaInP quaternary LED epitaxial wafer, and prepare the P surface ohmic contact pattern on the Au film 6 by conventional photolithography , leave two symmetrical square marks containing the ohmic contact layer of the P surface at the center of the upper and lower or left and right edges of the epitaxial wafer, with an area of 0.25-1mm 2 ,Such as Figure 4 As shown, the cross and X type are used for subsequent alignment, and the black area is a square mark; the reverse polarity AlGaInP quaternary LED epitaxial wafer includes a GaAs substrate 1, a barrier layer GaInP 2, and an opaque epitaxial layer from bottom to top. Doped GaAs 3, N-type AlGaInP layer 4, reverse polarity quaternary LED epitaxial layer 5; such as figure 2 shown.
[0050] Compared with other m...
Embodiment 2
[0062] The electrode alignment method of a kind of reverse polarity AlGaInP quaternary LED chip described in embodiment 1, its difference is, in step (4), comprises:
[0063] a. Paste a heat-resistant adhesive tape of the same size on the position of the N surface corresponding to the mark made in step (1); the N surface can be clearly displayed under strong light;
[0064] b. Evaporate a GeAu film with a thickness of 0.3-0.6 μm on the N surface by means of electron beam evaporation;
[0065] c. Remove the high temperature resistant tape, and the positive photoresist on the high temperature resistant tape is also removed;
[0066] d, put the whole epitaxial wafer into the etchant, corrode the epitaxial layer exposed in the region of the GeAu film, expose the N-type AlGaInP layer 4, see the mark of the ohmic contact pattern on the P surface, make the ohmic contact pattern on the N surface, make It is aligned with the P-side ohmic contact pattern. Since the N-type AlGaInP laye...
Embodiment 3
[0068] The electrode alignment method of a reverse polarity AlGaInP quaternary LED chip described in embodiment 1 or 2, the difference is that
[0069] In the step (1), a layer of AuBe film with a thickness of 0.3-0.4 μm is evaporated on the P surface of the reverse polarity AlGaInP quaternary LED epitaxial wafer.
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