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Width-bandwidth anti-reflection film, and preparation method thereof

An anti-reflection film, wide bandwidth technology, applied in sputtering plating, ion implantation plating, coating, etc., can solve the problems that anti-reflection film cannot be achieved, is difficult to achieve, low reflectivity, etc., and can improve the interface Defects, elimination of mirror reflection, excellent effect of anti-reflection performance

Inactive Publication Date: 2019-08-09
TRULY OPTO ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This traditional anti-reflection film can only achieve low reflectivity of visible light with a narrow bandwidth (380-780nm). It is difficult to achieve low reflectivity with a wide bandwidth. Anti-reflective coatings made in traditional ways cannot

Method used

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Examples

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Comparison scheme
Effect test

preparation example Construction

[0018] A method for preparing an anti-reflection film with a wide bandwidth, comprising the steps of:

[0019] S1. Provide the substrate;

[0020] The substrate can be optical glass, metal substrate or polymer material substrate, but not limited thereto.

[0021] S2. On the substrate, the A target and the B target are used to target the magnetron sputtering to deposit the mixture film layer. During the process of depositing the mixture film layer, the power of the A target is gradually reduced, and the power of the B target is simultaneously reduced. Gradually increasing; the mixture film layer includes component A and component B mixed and doped together, and the refractive index of the component A and component B is different; along the thickness direction from the substrate to the mixture film layer, the The content of component A in the film layer of the mixture gradually decreases, and the content of component B gradually increases.

[0022] Wherein, the specific operat...

Embodiment 1

[0034] A method for preparing an anti-reflection film with a wide bandwidth, comprising the steps of:

[0035] S1. Provide a substrate, the substrate is an optical glass, a metal substrate or a polymer material substrate; perform pretreatment on the substrate, the pretreatment includes one of ultrasonic cleaning, glow cleaning and ion etching cleaning one or more kinds;

[0036] S2. On the substrate, a silicon oxide target and a magnesium fluoride target are used to deposit the mixture film layer by magnetron sputtering, specifically: (1) the substrate is placed on a pair of silicon oxide targets and magnesium fluoride targets The sputtering chamber of the target magnetron sputtering machine, wherein the silicon oxide target and the magnesium fluoride target are placed against the target, and the sputtering chamber is evacuated to meet the requirements of magnetron sputtering; (2) to the sputtering Introduce working gas into the room; (3) Turn on the magnetron sputtering sili...

Embodiment 2

[0038] A method for preparing an anti-reflection film with a wide bandwidth, comprising the steps of:

[0039] S1. Provide a substrate, the substrate is an optical glass, a metal substrate or a polymer material substrate; perform pretreatment on the substrate, the pretreatment includes one of ultrasonic cleaning, glow cleaning and ion etching cleaning one or more kinds;

[0040] S2. On the substrate, a titania target and a silicon oxide target are used to deposit the mixture film layer by magnetron sputtering, specifically: (1) the substrate is placed on a counter-target magnetron sputtering device equipped with a titania target and a silicon oxide target The sputtering chamber of the sputtering machine, wherein the titanium dioxide target and the silicon oxide target are placed against the target, and the sputtering chamber is evacuated to meet the requirements of magnetron sputtering; (2) the working gas is introduced into the sputtering chamber; (3) Turn on the magnetron s...

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Abstract

The invention discloses a width-bandwidth anti-reflection film, and a preparation method thereof. The preparation comprises following steps: 1, a substrate is provided; 2, A target and B target facing-target magnetron sputtering is adopted for deposition of a mixture film layer on the substrate, wherein, in the mixture film layer deposition process, the A target power is reduced gradually, and theB target power is increased gradually. According to the preparation method, the A target and B target facing-target magnetron sputtering is adopted for deposition of the mixture film layer on the substrate, and in the mixture film layer deposition process, the A target power is reduced gradually, and the B target power is increased gradually, so that the refractive index of the formed mixture film layer changes along the film thickness direction gradually, the interface defects between different medium layers are improved, the antireflection performance and the antireflection bandwidth of theobtained anti-reflection film are improved to be the best, the bandwidth at reflectivity lower than 2% ranges from 200nm to 1200nm, low reflectivity bandwidth is enlarged, and the damage of light intensity change on eyesight is reduced.

Description

technical field [0001] The invention relates to the technical field of anti-reflection films, in particular to an anti-reflection film with wide bandwidth and a preparation method thereof. Background technique [0002] In order to improve the readability of the content displayed on the display screen under strong light, it is usually necessary to add an anti-reflection film to the upper surface of the display screen to reduce the reflectivity of the display screen surface. For outdoor products, it is especially necessary to add an anti-reflection film to the surface . The traditional anti-reflection film is composed of several layers of low refractive index material layers and high refractive index material layers alternately stacked, and the design of the film layer is carried out by optical simulation software. This traditional anti-reflection film can only achieve low reflectivity of visible light with a narrow bandwidth (380-780nm). It is difficult to achieve low reflec...

Claims

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Application Information

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IPC IPC(8): C03C17/22C23C14/35C23C14/06C08J7/06C08L101/00
CPCC03C17/22C03C17/006C23C14/352C23C14/06C08J7/06C03C2217/213C03C2217/285C03C2217/40C03C2217/29C03C2218/156C03C2217/732C08J2300/00
Inventor 吴德生李志成
Owner TRULY OPTO ELECTRONICS
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