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Sizing agent for reducing graphene oxide according to preset pattern, application method and obtained graphene film layer

A predetermined pattern, graphene film technology, applied in the direction of graphene, nano carbon, etc., can solve the problems of harsh environment, unsuitability, photoresist toxicity, etc., to achieve the effect of complete pattern and clear edge

Active Publication Date: 2019-10-08
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The photolithography process is relatively long and has strict environmental requirements. Photoresists usually have certain toxicity and are not suitable for general and quantitative preparation of graphene patterned films.

Method used

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  • Sizing agent for reducing graphene oxide according to preset pattern, application method and obtained graphene film layer

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0053] A method for preparing a patterned graphene film includes the following steps:

[0054] (1) Prepare a 10nm thick graphene oxide film on the surface of the PET film by spin coating;

[0055] (2) A slurry was prepared in a proportion of 50% by weight of aluminum powder (particle size of 10μm), 10% by weight of polyester resin (weight average molecular weight greater than 100,000), and 40% by weight of N-methylpyrrolidone, and the viscosity of the slurry was measured Is 1000 centipoise;

[0056] (3) Apply the slurry of step (2) to the surface of the graphene oxide film prepared in step (1) by screen printing, with a line width of 50 μm;

[0057] (4) Let stand for 1 min at a temperature of 50°C, dry for 5 min, pickle for 1 min, water for 2 min, and dry for 1 min. Finally, the graphene patterned film has a line width of 60 μm, clear edges, and complete graphene film. The thickness of the graphene patterned film was measured to be about 10 nm.

Embodiment 2

[0065] A method for preparing a patterned graphene film includes the following steps:

[0066] (1) Prepare a 1μm thick graphene oxide film on the surface of the PET film by dipping;

[0067] (2) According to the ratio of zinc powder (particle size of 2μm) 30wt%, polyurethane (weight average molecular weight of 250,000) 5wt%, DMF (N,N-dimethylformamide) 65wt%, the measured viscosity is 800 centipoise;

[0068] (3) Apply the slurry of step (2) to the surface of the graphene oxide film prepared in step (1) by screen printing, with a line width of 200 μm;

[0069] (4) Let stand for 5 minutes at a temperature of 30°C, dry for 5 minutes, pickle for 1 minute, wash for 2 minutes, and dry for 10 minutes. The final graphene patterned film has a line width of 220 μm, clear edges, and complete graphene film. The thickness of the graphene patterned film was measured to be about 1 μm.

Embodiment 3

[0077] A method for preparing a patterned graphene film includes the following steps:

[0078] (1) Prepare a 10μm thick graphene oxide film on the surface of the PP film by extrusion coating;

[0079] (2) According to the proportion of 30wt% of stannous chloride, 15wt% of PVP (polyvinylpyrrolidone) (weight average molecular weight of 150,000), and 55wt% of DMSO (dimethyl sulfoxide), the measured viscosity is 400%. Moor

[0080] (3) Apply the slurry of step (2) to the surface of the graphene oxide film prepared in step (1) by using gravure printing, with a line width of 500 μm;

[0081] (4) Let stand for 10 minutes at a temperature of 40°C, dry for 10 minutes, pickle for 5 minutes, water for 5 minutes, and dry for 15 minutes. The final graphene patterned film has a line width of 450 μm, clear edges and complete graphene film. The thickness of the graphene patterned film was measured to be 9.5 μm.

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Abstract

The invention relates to a sizing agent for reducing graphene oxide according to a preset pattern. The sizing agent comprises, by weight, 30-70% of reducing agents, 5-15% of macromolecular compounds and 15-65% of solvents. The sum of the components of the sizing agent accounts for 100%. The sizing agent with reducibility can be adhered to a graphene oxide film layer to contact with graphene oxide,and can be laid on the graphene oxide film layer according to the preset pattern to carry out a reduction reaction, and accordingly, the graphene oxide is reduced into the graphene film layer according to the preset pattern.

Description

Technical field [0001] The invention belongs to the field of graphene film preparation, and specifically relates to a slurry for reducing graphene oxide according to a predetermined pattern, a use method and a graphene film layer obtained. Background technique [0002] Graphene, as a kind of atomic layer two-dimensional nanomaterial with good electrical conductivity, high strength and high thermal conductivity, is currently receiving extensive attention from scientific research and the market, and has important forward-looking application value. As a kind of graphene material, graphene membrane is widely used in electronic devices, seawater desalination, new energy materials and other fields. [0003] As a basic technology for device construction, patterning technology is currently applied in a large number of fields. In order to realize the refined combination of circuits, devices, and components, the patterning technology has gradually developed from the original millimeter leve...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B32/184
CPCC01B32/184
Inventor 邱雄鹰智林杰宁静
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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