Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Analysis method for contact stress distribution of gradient elastic grinding and polishing disc

A contact stress, analytical method technology, applied in special data processing applications, instruments, electrical digital data processing, etc., can solve the problems of poor processing efficiency and quality controllability, uneven material removal, high cost, and improve processing. Efficiency and process quality, increased design accuracy, simplified problem solving

Active Publication Date: 2019-11-12
ZHEJIANG UNIV OF TECH
View PDF2 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the processing methods for such hard and brittle materials mainly include stress disk, magneto-fluidic flow, ion beam, jet flow, etc. While making relevant technical breakthroughs, there are uneven material removal, poor processing efficiency and quality controllability, etc. The problem is that it is impossible to guarantee that the medium and high frequency errors can be further suppressed on the basis of not deteriorating the surface accuracy of the workpiece
At the same time, due to the essential problem of uneven material removal at each point in the contact area, it increases the difficulty of controlling the workpiece surface shape accuracy and surface quality consistency, that is, increases the difficulty of optimizing the processing trajectory and dwell time algorithm, making processing time-consuming and laborious , the cost is also higher

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Analysis method for contact stress distribution of gradient elastic grinding and polishing disc
  • Analysis method for contact stress distribution of gradient elastic grinding and polishing disc
  • Analysis method for contact stress distribution of gradient elastic grinding and polishing disc

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0052] The present invention will be further explained below in conjunction with the drawings:

[0053] Such as Figure 1~7 As shown, the invention relates to a gradient-based elastic polishing plate including a rigid layer of the polishing plate 1, an elastic gradient layer of the polishing plate 2, a workpiece 3, a mold 4 and a workpiece fixing plate 5. The elastic gradient layer 2 of the polishing plate is fixed on the polishing plate Above the rigid layer 1, the workpiece 3 is mounted on the workpiece mounting plate 5 through the matching mold 4, and the workpiece 3 is set directly above the elastic gradient layer 2 of the polishing plate.

[0054] An analytical method for the contact stress distribution of a gradient elastic polishing disc, including the following steps:

[0055] Step 1: First, establish the removal function MRR(y) according to the processing requirements of the workpiece, select the appropriate angular velocity ω, then the relative linear velocity distribution...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an analysis method for contact stress distribution of a gradient elastic grinding and polishing disc. The method comprises the following steps of (1) establishing a removal function MRR(y) according to the machining requirement of a workpiece; (2) obtaining an ideal contact stress distribution function P*(y) according to a Preston equation, and determining an ideal elasticmodulus distribution function E*(y) of the grinding and polishing disc in the radial direction y through the P*(y); (3) establishing an in-plane gradient distribution elastic thin layer contact modelaccording to E*(y), introducing a compensation function H(z) to compensate the influence of non-principal axis stress on contact stress P(y) according to lateral deformation epsilon x and epsilon y, correcting deformation displacement L of a gradient elastic layer in the vertical direction, and deriving a contact stress analysis equation P(y) by using a semi-inverse solution; and (4) constructinga simulation model, completing static stress simulation, establishing a coupling relationship between a simulation result and an analytical equation, assuming a compensation function expression, and completing an optimization equation of a contact stress analytical solution.

Description

Technical field [0001] The present invention relates to the technical field of ultra-precision machining, and more specifically, to an analytical method for the contact stress distribution of a gradient elastic polishing disc. Background technique [0002] With the rapid development of the high-tech industry, hard and brittle materials such as sapphire, silicon wafers, and optical glass have been widely used in the optical and electronic industries due to their high hardness, high melting point, and high wear resistance. The surface accuracy and surface quality of such materials have a key influence on the quality and life of the device. [0003] At present, the processing methods for such hard and brittle materials mainly include stress plates, magneto-fluidics, ion beams, jets, etc. While achieving relevant technological breakthroughs, there are uneven material removal, poor processing efficiency and quality controllability, etc. The problem is that there is no guarantee that th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F17/50
CPCY02T90/00
Inventor 金明生朱栋杰王礼明董晓星康杰
Owner ZHEJIANG UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products