Communication chip and preparation method for homogenously integrated light source, detector and active waveguide
A communication chip and detector technology, which is applied in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve the complex preparation process of heterogeneous integrated communication chip devices, the insulating isolation layer cannot provide effective light reflection, passive The problem of large waveguide transmission loss, etc., can improve the success rate of preparation, realize wafer-level integration, and reduce the difficulty of preparation.
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[0032] The following examples further illustrate the content of the present invention, but should not be construed as limiting the present invention. Without departing from the spirit and essence of the present invention, the modifications and substitutions made to the methods, steps or conditions of the present invention all belong to the scope of the present invention.
[0033] Example:
[0034] like figure 1 , figure 2 , image 3 and Figure 4 As shown, a communication chip with a homogenously integrated light source, detector and active waveguide is prepared based on a GaN wafer on a silicon substrate, and the GaN wafer on a silicon substrate includes a p-GaN layer from top to bottom 7. InGaN multi-quantum well layer 6, InGaN waveguide layer 5, AlGaN cladding layer 4, n-GaN layer 3, buffer layer 2 and silicon substrate layer 1. The communication chip that homogeneously integrates light source, detector and active waveguide is prepared based on silicon substrate gallium...
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