Corrosion-resistant and wear-resistant protective coating and preparing method and application thereof
A protective coating, wear-resistant technology, applied in the direction of coating, metal material coating process, ion implantation plating, etc., can solve the problems of corrosion and wear, high corrosion resistance requirements, microbial corrosion and other problems , to achieve excellent corrosion resistance and wear resistance, enhanced corrosion resistance, and achieve the effect of carbon doping
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[0025] The present invention provides a preparation method for the protective coating described in the above technical solution, comprising the following steps:
[0026] Take TaB 4 The target and the carbon target are target materials, and the protective coating is obtained by co-sputtering on the surface of the substrate by magnetron sputtering.
[0027] In the present invention, in the magnetron sputtering process, the TaB 4 The target and the carbon target are sputtered at the same time, so that the plasma released by the two targets evenly coats the surface of the substrate. In the present invention, the TaB 4 The positional relationship between the target and the carbon target and the substrate is preferably: keep the same inclination angle and distance of the substrate relative to the normal line of the two targets; the TaB 4 The target-base distance between the target and the substrate is preferably 6-8 cm, and the target-base distance between the carbon target and t...
Embodiment 1
[0038] A corrosion-resistant and wear-resistant protective coating (TaB-C coating) was deposited using a magnetron sputtering system, using a titanium sheet as a substrate, followed by ultrasonic cleaning with acetone, ethanol and distilled water for 20 min, and then drying; 4 The target (purity is 99.95%, Ta:B atomic percentage is 20%:80%) and the C target (purity is 99.95%) are respectively located at 7cm away from the substrate; keep the substrate relative to the two target normal tilt angle and The distance is the same, and the distance between the two targets is kept at 9cm; the vacuum of the coating chamber is kept at 6×10 by the turbomolecular pump before sputtering -4 Pa, and introduce 90sccm argon gas (purity is 99.99%), and keep the working pressure of 0.8Pa; During deposition, control substrate temperature is 400 ℃, and the applied bias voltage is-80V; Adopt co-sputtering method, carbon target The power of the RF power supply is 100W, TaB 4 The current of the targe...
Embodiment 2
[0040] The preparation method is basically the same as in Example 1, except that the power of the carbon target radio frequency power supply is 150W, the thickness of the TaB-C coating is 1.5 μm, and the hardness is 33.2GPa; by X-ray photoelectron spectroscopy (XPS) The Ta content in the obtained TaB-C coating is 29.2 at.%, the B content is 59.9 at.%, and the C content is 10.9 at.%.
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