Unlock instant, AI-driven research and patent intelligence for your innovation.

Annular-structure lower distributed Bragg reflector vertical cavity surface emitting semiconductor laser

A technology of Bragg reflector and vertical cavity surface emission, which is applied in the direction of semiconductor lasers, lasers, laser components, etc., can solve the problems of unfavorable mass production of devices, reduction of injection current conversion efficiency, difficulty in controlling ion implantation uniformity, etc.

Active Publication Date: 2020-02-21
CHANGCHUN UNIV OF SCI & TECH
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, in order to fabricate a distributed Bragg reflector with a ring structure in the existing vertical cavity surface emitting semiconductor laser, it is necessary to form the hollow part 10 by wet etching or dry etching, and to form the high resistance region 9 by hydrogen ion implantation, which It not only leads to more steps in the device manufacturing process, but also increases the difficulty of the process. For example, the depth of corrosion or etching is not easy to control, and the uniformity of ion implantation is not easy to grasp, which is not conducive to the mass production of devices.
The ensuing problems are at least the following four points: 1. The problem of process damage. Since the hollow part 10 is made on the side of the light outlet of the device, the wet etching or dry etching process will be distributed on the upper side. The outer mirror surface of the Bragg reflector 3 and the inner cylindrical surface of the laser ring cylindrical resonator cause damage, which can easily cause irreversible cavity structure damage, greatly reducing the device yield; at the same time, because the outer mirror surface of the upper distributed Bragg reflector 3 And the roughness of the inner cylindrical surface of the laser ring cylindrical resonator is increased, and the lasing light will be reflected in multiple steps, resulting in more stray light, which reduces the conversion efficiency of the injected current; 2. The quality of the hollow laser beam is difficult to guarantee, because The hydrogen ion implantation process is used to form the high-resistance region 9, but the uniformity of the implantation is not easy to grasp, resulting in that the light intensity in the center of the hollow laser beam is not absolutely zero, and the size of the dark spot is uncontrollable; 3. The problem of device packaging, due to the hollow part 10 Located on the side of the light outlet of the device, whether it is a single-tube package or an array package, it is very easy to cause mechanical damage to the cavity of the resonator, and it is difficult to improve the packaging process. For example, in the gold wire (making electrode leads) process, the upper distribution The Bragg reflector 3 bears too much stress per unit volume, which may easily cause mechanical damage to the cavity; for another example, in the array placement process, the contact area between the placement head and the array is small and the pressure is high, which may also easily cause mechanical damage to the cavity of the resonator; 4 1. Problems in the use of the device. Since the hollow part 10 is located on the side of the light outlet of the device, it is difficult to couple the device with optical components such as optical fibers and lenses in later practical applications, which limits the application range of the device.
[0005] Another problem is that all kinds of semiconductor lasers have common problems, that is, because the substrate material, such as GaAs, is a material with poor thermal conductivity, and the parts that play a role in heat dissipation, such as plate-shaped heat sinks, heat sinks, etc. The heat dissipation of the die is achieved through contact with the substrate, so the heat dissipation effect of the device needs to be improved

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Annular-structure lower distributed Bragg reflector vertical cavity surface emitting semiconductor laser
  • Annular-structure lower distributed Bragg reflector vertical cavity surface emitting semiconductor laser
  • Annular-structure lower distributed Bragg reflector vertical cavity surface emitting semiconductor laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0014] The bottom distributed Bragg reflector vertical cavity surface-emitting semiconductor laser of the present invention has an upper electrode 1, an ohmic contact layer 2, an upper distributed Bragg reflector 3, an oxide confinement layer 4, an active gain region 5, and the like from top to bottom. The lower distributed Bragg reflector 6, the substrate 7, the lower electrode 8; the material of the upper electrode 1 is Ti / Pt / Au. The material of the ohmic contact layer 2 is GaAs. The upper distributed Bragg reflector 3 is made of P-type Al 0.1 Ga 0.9 As / Al 0.8 Ga 0.2 As. The oxide confinement layer 4 material is Al 2 o 3 . The material of the active gain region 5 is GaAs / AlGaAs. The material of the lower distributed Bragg reflector 6 is N-type Al 0.1 Ga 0.9 As / Al 0.8 Ga 0.2As. The material of the substrate 7 is GaAs. The material of the lower electrode 8 is Au / Ge / Ni; the shape of the upper electrode 1 and the oxide confinement layer 4 is a ring with the same in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
heightaaaaaaaaaa
Login to View More

Abstract

An annular-structure lower distributed Bragg reflector vertical cavity surface emitting semiconductor laser belongs to the technical field of semiconductor lasers. In the prior art, a light outlet hasprocess damages and is not easy to be well coupled with elements such as optical fibers and lenses, so the heat dissipation effect of the device needs to be improved. The laser sequentially comprisesan upper electrode, an ohmic contact layer, an upper distributed Bragg reflector, an oxide limiting layer, an active gain region, a lower distributed Bragg reflector, a substrate and a lower electrode from top to bottom; the upper electrode and the oxide limiting layer are in the shape of a ring with the same inner diameter, the width of the ring ranges from 3 micrometers to 5 micrometers, and the outer diameter of the ring ranges from 115 micrometers to 125 micrometers. A cylindrical hollow region exists in the central parts of the lower distributed Bragg reflector, the substrate and the lower electrode; the top face of the cylindrical hollow area is lower than the inner mirror face of the lower distributed Bragg reflector and higher than the outer mirror face of the lower distributed Bragg reflector, the diameter of the cylindrical hollow area ranges from 85 micrometers to 95 micrometers, and the cylindrical hollow area is filled with high-thermal-conductivity welding flux.

Description

technical field [0001] The invention relates to a vertical cavity surface-emitting semiconductor laser of a distributed Bragg reflector under a ring structure, belonging to the technical field of semiconductor lasers. Background technique [0002] Hollow Laser Beam (Hollow Laser Beam, HLB) is a ring-shaped beam with zero central light intensity in the direction of propagation, also known as hollow beam or dark hollow beam (Takahiro Kuga, Yoshio Torii, Noritsugu Shiokawa, et al.Novel OpticalTrapofAto6mswithaDoughnutBeam[J].PhysRevLett , 1997, 78:4713-4716). In other words, a hollow laser beam is a beam with zero optical axis intensity. Hollow beams have a series of novel and unique physical properties, such as barrel-shaped intensity distribution, small dark spot size (DSS), propagation invariance, and spin and orbital angular momentum. As a laser catheter, optical tweezers (optical tweezers) and optical wrench, the hollow beam becomes a powerful tool for precise manipulati...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/183H01S5/024
CPCH01S5/02469H01S5/02476H01S5/183H01S5/18358
Inventor 晏长岭杨静航逄超冯源郝永芹张剑家
Owner CHANGCHUN UNIV OF SCI & TECH
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More