Smelting method for high-purity low-oxygen recovery sputtering target material
A sputtering target, high-purity technology, applied in sputtering plating, metal material coating process, ion implantation plating, etc. problems, to achieve the effect of improving the utilization value, uniform distribution of ingot components, and low cost
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[0017] The smelting method of the high-purity low-oxygen recovery sputtering target of the present invention comprises the following specific steps:
[0018] 1) Detecting and analyzing the recovered target material, high-purity hypoxic metal crystal / powder, and its gas and impurity content, and calculating the dosage ratio of the recovered target material and the high-purity low-oxygen metal crystal / powder;
[0019] 2) According to the calculated dosage ratio, the length of the silo, and the length of the recycled target material, calculate the number of layers of the recovered target material after the silo is covered;
[0020] 3) Mix high-purity low-oxygen metal crystals / powders evenly and press them into blocks;
[0021] 4) Stack the recovered target material and the block, and cover the bin;
[0022] 5) Put the stacked recovered target material and block into the electron beam melting furnace to melt and cast ingots.
[0023] In step 1), the high-purity low-oxygen metal ...
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