Microporous Cu-MOF material, preparation method and applications thereof
A microporous, CH4 technology, applied in separation methods, chemical instruments and methods, and other chemical processes, can solve problems such as equipment corrosion, high adsorption capacity and selectivity, and high energy consumption in the desorption process, achieving mild conditions and good The effect of selective adsorption performance and ease of mass production
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Embodiment 1
[0030] A kind of microporous Cu-MOF material, its chemical formula is CuTIPA · n (DMF) (n=1-3), wherein TIPA 2- It is 5-(triazol-1-yl)isophthalic acid anion, DMF is N,N-dimethylformamide, TIPA 2- The simplified structure is as follows:
[0031]
Embodiment 2
[0033] A kind of preparation method of microporous Cu-MOF material as described in embodiment 1, comprises the following steps:
[0034] 11.6mg of H 2 TIPA was placed in a 20mL vial with a polytetrafluoroethylene lid, and 11.6mg of a mixed solvent was added to it, which was formed by mixing 1mL of water, 2mL of DMF, and 1mL of DMA, and then 50uL 1mol / L copper nitrate solution and added to the medium, sonicated until copper nitrate trihydrate and H 2 TIPA was mixed evenly, and then the above-mentioned vial was covered and placed in an oven at 85°C for three days to react to obtain blue rod-shaped crystals, which were microporous Cu-MOF materials.
Embodiment 3
[0036] The microporous Cu-MOF material as described in Example 2 is effective in the selective separation of CO 2 / N 2 and CO 2 / CH 4 in the application.
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