Random copolymer and pinning composition comprising same

A technology of random copolymer and pinned layer, which can be used in chemical instruments and methods, synthetic resin layered products, photoengraving process of pattern surface, etc., and can solve the problems of insufficient bonding and other problems.

Active Publication Date: 2020-05-15
LG CHEM LTD
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is a problem that typical pinned layers cannot be sufficiently bonded to the base layer at low temperatures (for example, at temperatures below 130° C.)

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Random copolymer and pinning composition comprising same
  • Random copolymer and pinning composition comprising same
  • Random copolymer and pinning composition comprising same

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0157]Preparation Example 1. Synthesis of Monomer (A)

[0158] A compound (DPM-C12) of the following formula A was synthesized in the following manner. Hydroquinone (10.0g, 94.2mmol) and 1-bromododecane (23.5g, 94.2mmol) were placed in a 250mL flask, dissolved in 100mL of acetonitrile, then an excess of potassium carbonate was added thereto and under nitrogen React at 75°C for about 48 hours. After the reaction, remaining potassium carbonate was filtered off, and acetonitrile used in the reaction was also removed. A mixed solvent of DCM (dichloromethane) and water was added thereto to treat the mixture, and the separated organic layer was collected and passed through MgSO 4 for dehydration. Subsequently, the target product (4-dodecyloxyphenol) (9.8 g, 35.2 mmol) was obtained as a white solid phase in about 37% yield using DCM (dichloromethane) in column chromatography.

[0159]

[0160] 1 H-NMR (CDCl 3 ): δ6.77(dd, 4H); δ4.45(s, 1H); δ3.89(t, 2H); δ1.75(p, 2H); δ1.43(p...

preparation example 2

[0167] Preparation example 2. Synthesis of random copolymer (B)

[0168] 1.677 g pentafluorostyrene, 0.084 g (methacryloyloxy)methylphosphonic acid (hMAPC1), 10 mg RAFT (reversible addition-fragmentation chain transfer) reagent (2-cyano-2-propyl disulfide Benzoate), 6mg V-40 (1,1'-azobis(cyclohexanecarbonitrile)) and 1.777g benzotrifluoride were placed in a 10mL flask (Schlenk flask), and the After stirring at room temperature for 30 minutes, RAFT (reversible addition-fragmentation chain transfer) polymerization was carried out at 95° C. for 3 hours. After polymerization, the reaction solution was precipitated in 200 mL of methanol as an extraction solvent, filtered under reduced pressure, and then dried to prepare a random copolymer (B). In the random copolymer (B), the content of units derived from pentafluorostyrene was about 94.3% by weight.

preparation example 3

[0169] Preparation Example 3. Synthesis of Random Copolymer (C)

[0170] 2.974g of the monomer (A) of Preparation Example 1, 0.081g of (methacryloyloxy)methylphosphonic acid (hMAPC1), 10mg of RAFT (reversible addition-fragmentation chain transfer) reagent (2-cyano-2- Propyl dithiobenzoate), 6 mg V-40 (1,1'-azobis(cyclohexanecarbonitrile)) and 1.777 g benzotrifluoride were placed in a 10 mL flask (Schlenk flask), and placed in After stirring at room temperature for 30 minutes under nitrogen atmosphere, RAFT (reversible addition-fragmentation chain transfer) polymerization was carried out at 95° C. for 3 hours. After polymerization, the reaction solution was precipitated in 200 mL of methanol as an extraction solvent, filtered under reduced pressure, and then dried to prepare a random copolymer. In the random copolymer (C), the content of units derived from the monomer (A) of Production Example 1 was about 96.8% by weight.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
dispersityaaaaaaaaaa
Login to view more

Abstract

The present application relates to a pinning composition, a laminate comprising the same and a manufacturing method therefor. The pinning composition of the present application can provide orientationand position selectivity to a polymer membrane comprising the self-assembly structure of a block copolymer. The pinning composition of the present application exhibits the excellent reaction selectivity, and thus can form a vertical lamellar structure having a high alignment. In addition, the pinning composition of the present application can be suitable for being applied to a low temperature process.

Description

technical field [0001] This application claims the benefit of the filing date of Korean Patent Application No. 10-2017-0141006 filed on October 27, 2017, the disclosure of which is incorporated herein by reference in its entirety. [0002] This application relates to random copolymers and pinning compositions comprising the same. Background technique [0003] In block copolymers, two or more chemically distinct polymer chains are linked by covalent bonds. Block copolymers can separate into regular microphases due to their self-assembly properties. This microphase separation phenomenon of block copolymers is usually explained by the volume fraction, molecular weight or mutual attraction coefficient (Flory-Huggins interaction parameter) between the components. In addition, block copolymers can form various nanostructures, such as nanostructured spheres, cylinders, gyroids, or layers. [0004] In general, the orientation of the nanostructures in films formed from block copol...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C08L33/14C08F220/30C08F220/32C08F212/14C08F230/02B32B27/28H01L21/027H01L21/324
CPCB32B27/28C08F230/02C08L33/14C08F212/20C08F220/301C08F2438/03C09D143/02G03F7/0002H01L21/0271C08F220/325H01L21/0274H01L21/324C08F220/32C08F293/005C08F220/44C09D5/002C09D133/20C09D153/00
Inventor 具世真李美宿姜那那李应彰尹圣琇朴鲁振李济权崔银英柳亨周许允衡
Owner LG CHEM LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap