Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Wet CMP mirror polishing solution for stainless steel mobile phone middle frame and preparation method of wet CMP mirror polishing solution

A technology of mirror polishing and mobile phone middle frame, which is applied in the field of mirror polishing liquid, which can solve the problems that it is difficult to achieve mirror effect on stainless steel surface, damage the health of operators, metal dust pollution and other problems, achieve excellent polishing performance, save manpower and cost low effect

Inactive Publication Date: 2020-06-05
HENAN UNION ABRASIVES
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The polishing liquid used in electrolytic polishing and chemical polishing is mostly a strong acid solution, which pollutes the environment and damages the health of operators
Sandpaper consumables are mostly used for mechanical polishing, the pollution of metal dust is serious, and the working environment is harsh
The most important thing is that it is difficult to achieve the required mirror effect on the surface of stainless steel processed by the above methods

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Wet CMP mirror polishing solution for stainless steel mobile phone middle frame and preparation method of wet CMP mirror polishing solution

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] The formula of the present embodiment polishing liquid is:

[0029] Component A: 5 parts of oleic acid, 10 parts of paraffin, 1 part of triethanolamine, 10 parts of OP-10, 80 parts of water;

[0030] Component B: 10 parts of α-alumina, 2 parts of PAAS, 3 parts of benzotriazole, 3 parts of potassium sorbate, 4 parts of silicone oil, and 90 parts of water.

[0031] The preparation method of the polishing liquid of the present embodiment is as follows:

[0032] (1) Preparation method of component A: Mix the weighed oleic acid, paraffin, triethanolamine, and OP-10 together, heat to 110°C to completely melt, and keep stirring. Weigh 90°C hot water, slowly add it to the mixed liquid, keep the liquid temperature at 70°C-90°C, the mixed liquid will change from oily to watery, and the transition time will take about 20-60 minutes;

[0033] (2) Preparation method of component B: Weigh 90 parts of deionized water, add PAAS, benzotriazole, potassium sorbate, silicone oil in seque...

Embodiment 2

[0036] The formula of the present embodiment polishing liquid is:

[0037] Component A: 3 parts of stearic acid, 5 parts of oleic acid, 10 parts of paraffin wax, 5 parts of palm wax, 1 part of triethanolamine, 10 parts of OP-10, 70 parts of water;

[0038] Component B: 10 parts of α-alumina, 2 parts of sodium hexametaphosphate, 3 parts of benzotriazole, 10 parts of sodium sorbate, 2 parts of tributyl phosphate, and 80 parts of water.

[0039] The preparation method of the polishing liquid of the present embodiment is as follows:

[0040] (1) Preparation method of component A: Mix the weighed stearic acid, oleic acid, paraffin wax, palm wax, triethanolamine, and OP-10 together, heat to 110°C to completely melt, and keep stirring. Weigh hot water at 90°C, slowly add it to the melted mixed liquid, keep the temperature of the liquid at 70°C-90°C, the mixed liquid will change from oily to watery, and the transition time will take about 20-60 minutes;

[0041] (2) Preparation meth...

Embodiment 3

[0044] The formula of the present embodiment polishing liquid is:

[0045] Component A: 10 parts of oleic acid, 5 parts of paraffin, 10 parts of beeswax, 2 parts of triethanolamine, 3 parts of Span 80, 10 parts of Tween 20, 100 parts of water;

[0046] Component B: 20 ​​parts of α-alumina, 2 parts of sodium hexametaphosphate, 3 parts of barium petroleum sulfonate, 5 parts of sodium benzoate, 2 parts of silicone oil, and 90 parts of water.

[0047] The preparation method of the polishing liquid of the present embodiment is as follows:

[0048] (1) Preparation method of component A: Mix the weighed oleic acid, paraffin, beeswax, triethanolamine, Span 80, and Tween 20 together, heat to 90°C to completely melt, weigh 80°C hot water, slowly add to melt In the mixed liquid, keep the temperature of the liquid at 70°C-85°C and keep stirring until the mixed liquid changes from oily to watery, and the transition time takes about 20-50min.

[0049](2) Preparation method of group B: Wei...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a wet CMP mirror polishing solution for a stainless steel mobile phone middle frame and a preparation method of the wet CMP mirror polishing solution. The wet CMP mirror polishing solution is composed of a component A and a component B,the component A is prepared from the following components in parts by weight: 5 to 30 parts of an organic acid, 3 to 40 parts of a wax, 4 to20 parts of an emulsifier and 30 to 100 parts of deionized water; the component B is prepared from the following components in parts by weight: 4-60 parts of an abrasive, 5-10 parts of a suspending agent, 1-5 parts of a corrosion inhibitor, 1-5 parts of a preservative, 1-10 parts of a defoaming agent and 20-100 parts of deionized water. The prepared polishing solution is good in dispersity and suspension property, and the phenomena of precipitation, layering and cakingoccured after long-time storage are avoided; the lubricating property is good, and scratches and microcracks on the stainlesssteel surface are greatly reduced; all the components are water-soluble, so that the cleaning is easy, and the adhesion of impurities and dirt is avoided; the light emitting effect is good, and the polished stainless steel surface achieves the mirror surface effect; cost is low, maintenance is convenient, and recycling can be achieved.

Description

technical field [0001] The invention relates to a mirror polishing liquid for processing stainless steel mobile phone middle frames CMP, in particular to a wet CMP mirror polishing liquid for stainless steel mobile phone middle frames and a preparation method thereof, which can polish the stainless steel mobile phone middle frames to the mirror surface and is rich in A polishing consumable with gloss and no bad defects belongs to the technical field of materials, specifically, it is a polishing liquid for wet grinding and polishing. Background technique [0002] Since the release of the iPhone 4, its beautiful appearance has become a design classic, and the design of the stainless steel middle frame has also become a model for the mobile phone industry to imitate. Although stainless steel has high strength, its toughness, strong abrasive adhesion, poor thermal conductivity, and frictional heat are not easy to dissipate, making it difficult to process stainless steel middle f...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 常磊刘丹丹汪静
Owner HENAN UNION ABRASIVES
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com