Aluminum-scandium alloy target material and preparation method thereof

An alloy target, aluminum scandium technology, applied in metal material coating process, vacuum evaporation coating, coating and other directions, can solve the problems of small scandium content selection range, uneven target composition, inability to sputter coating, etc. To achieve the effect of large optional range, uniform composition and structure, and improved film quality

Active Publication Date: 2020-07-28
湖南高创稀土新材料有限责任公司
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0008] The purpose of the present invention is to provide a high-performance aluminum-scandium alloy target and its preparation method to solve the problems in the prior art of target material composition unevenness, high oxygen content, low density, small optional range of scandium content, and alloy The problem of low purity and inability to sputter coating

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  • Aluminum-scandium alloy target material and preparation method thereof
  • Aluminum-scandium alloy target material and preparation method thereof

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[0025] An embodiment of the present invention provides a method for preparing an aluminum-scandium alloy target. The method includes: selecting metal aluminum and metal scandium with a purity of more than 99.99% (no particle size requirement); the mass percentage of metal scandium is 5%~ 40%, and the mass percentage content of metal aluminum is 60% to 95%. The metal aluminum is mixed into metal scandium in pairs, and the mass of metal aluminum mixed each time does not exceed 200% of the total mass of scandium. Hold the heat for 5-15 minutes for the first time, and obtain the expected aluminum-scandium alloy through repeated melting; then cast the aluminum-scandium alloy melt into the mold to obtain the aluminum-scandium alloy target blank; press the aluminum-scandium alloy target blank to obtain aluminum-scandium alloy through pressure processing and heat treatment alloy target. Among them, the mold can be selected from water-cooled copper mold, or cast iron mold with air cool...

Embodiment 1

[0028] Select 3600g of metal aluminum with a purity of more than 99.99%, select 400g of metal scandium with a purity of more than 99.99%, and divide the metal aluminum into 7 parts. Put the scandium metal into the water-cooled copper crucible, put the first metal aluminum into the feeder, evacuate the suspension furnace to below 1Pa, and fill it with inert gas; Turn the alloy ingot into a water-cooled copper crucible, then add a second portion of metal aluminum to the feeder, melt and keep it warm again according to the above method, and repeat the above steps until an aluminum-scandium alloy with a scandium content of 10% is obtained; finally, the alloy solution is cast into In a Φ200mm water-cooled copper mold, an aluminum-scandium alloy target blank was obtained.

[0029] After peeling the above aluminum-scandium alloy ingot, heat the ingot and the Φ215mm steel mold at 520°C for 60min. Place the heat-preserved aluminum-scandium alloy ingot and mold under a forging press to...

Embodiment 2

[0032] Select 3200g of metal aluminum with a purity of more than 99.99%, select 800g of metal scandium with a purity of more than 99.99%, and divide the metal aluminum into 3 parts. Metal scandium is put into a water-cooled copper crucible, the first metal aluminum is put into a feeder, the suspension furnace is evacuated to below 1Pa, and inert gas is filled. After metal scandium is melted, add aluminum, smelt and keep warm for 10 minutes, after cooling and taking out, turn the alloy ingot into a water-cooled copper crucible, then add the second metal aluminum to the feeder, and repeat the above method until the scandium content reaches 20% aluminum scandium alloy. Finally, the alloy solution was cast into a Φ200mm water-cooled copper mold to obtain an aluminum-scandium alloy target blank. The internal microstructure photo of the aluminum-scandium alloy target embryo is as follows: figure 1 shown.

[0033] After peeling the aluminum-scandium alloy ingot, the aluminum-scand...

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Abstract

The invention discloses an aluminum-scandium alloy target material and a preparation method thereof. The preparation method comprises the following steps of: selecting metal aluminum and metal scandium with the purity of 99.99% or above; preparing materials according to the mass percent of the metal scandium being 5%-40% and the mass percent of the metal aluminum being 60%-95%, and doping the metal aluminum into the metal scandium in pairs for multiple times, and repeatedly smelting to obtain an expected aluminum-scandium alloy; casting the aluminum-scandium alloy into a mold to obtain an aluminum-scandium alloy target blank; and machining the aluminum-scandium alloy target blank to obtain the aluminum-scandium alloy target material. By adopting the aluminum-scandium alloy target materialand the preparation method thereof, the problems that in the prior art, homogenization of target material components is difficult to realize, scandium distribution is not uniform, the oxygen content of the target material is high, the density is low, the alloy purity is low, and the target material cannot be used for preparing a sputtering coating film can be solved.

Description

technical field [0001] The invention relates to the technical field of aluminum alloy target processing and preparation, in particular to an aluminum-scandium alloy target and a preparation method thereof. Background technique [0002] Aluminum-scandium alloys are mainly used for sputtering targets in special fields, for example, in the preparation process of micro-electromechanical systems (MEMS) integrating micro-sensors, actuators, signal processing and control circuits, interface circuits, communications and power supplies. Generally, an aluminum-scandium alloy target is used as a sputtering source to form an aluminum-scandium alloy film by sputtering. The melting point of metal scandium is as high as 1541°C, and its chemical properties are active. It is quite different from the melting point of aluminum. When directly fused, the two are not easy to mix evenly, and the segregation is serious, which seriously affects the quality of the film layer. [0003] Therefore, the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C22C21/00C22C1/02C22F1/04C22F1/02C23C14/34
CPCC22C21/00C22C1/026C22F1/04C22F1/02C23C14/3414
Inventor 黄培黄美松王志坚刘华邓月华马小波文康刘维
Owner 湖南高创稀土新材料有限责任公司
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