Low-temperature normal-pressure sintering preparation method of mass-producible high-purity SiC ceramic coating
A low-temperature, normal-pressure, ceramic coating technology, which is applied in the field of low-temperature and normal-pressure sintering preparation of high-purity SiC ceramic coatings, can solve problems such as the inability to guarantee the purity of SiC ceramic materials, harsh preparation conditions, and high production costs, and achieve controllable Sexuality, good combination, low cost effect
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Embodiment 1
[0032] Step 1: Use high-purity SiC powder with a purity ≥ 99% and a particle size of 500nm as a raw material, dissolve it in ethanol and butanone with a mixing ratio of 1:1, add triethyl phosphate with a mass fraction of 2%, and then transfer it to a ball mill tank, After milling with agate balls for 8 to 12 hours, continue to add polyvinyl butyral with a mass fraction of 3%, glycerol and dioctyl phthalate with a mass fraction of 3%, and a mixing ratio of 1:1, with a mass fraction of 5% High-purity Si powder and boron carbide powder with a mass fraction of 2% were ball milled for 8 to 12 hours.
[0033] Step 2: Apply the high-purity SiC slurry formed in Step 1 evenly on the surface of the reaction sintered SiC substrate, and dry at room temperature to form a pre-coating layer.
[0034] Step 3: Sinter the pre-coating layer obtained in step 2 under an inert atmosphere at a heating rate of 2.5° C. / min, a sintering temperature of 1750° C. to 1800° C., keep the temperature for 2 to...
Embodiment 2
[0036] Step 1: Use high-purity SiC powder with a purity ≥ 99% and a particle size of 3-5 μm as a raw material, dissolve it in ethanol and methyl ethyl ketone with a mixing ratio of 1:1, add 2% triethyl phosphate by mass fraction, and transfer to a ball mill tank, after milling with agate balls for 8-12 hours, continue to add polyvinyl butyral with a mass fraction of 3%, glycerol and dioctyl phthalate with a mass fraction of 3%, and a mixing ratio of 1:1. 5% high-purity Si powder, 2% boron carbide powder by mass fraction, followed by ball milling for 8-12 hours.
[0037] Step 2: Apply the high-purity SiC slurry formed in Step 1 evenly on the surface of the reaction sintered SiC substrate, and dry at room temperature to form a pre-coating layer.
[0038] Step 3: Sinter the pre-coating layer obtained in step 2 under an inert atmosphere at a heating rate of 2.5° C. / min, a sintering temperature of 1750° C. to 1800° C., keep the temperature for 2 to 3 hours, and then cool down natural...
Embodiment 3
[0040] Step 1: Use high-purity SiC powder with a purity ≥ 99% and a particle size of 500nm as raw material, add 5% high-purity SiC whiskers, dissolve in ethanol and butanone with a mixing ratio of 1:1, and add 2% phosphoric acid by mass fraction Triethyl ester is then transferred to a ball mill tank, and after ball milling with agate balls for 8 to 12 hours, continue to add polyvinyl butyral with a mass fraction of 3%, glycerol and o-phthalic acid with a mass fraction of 3%, and a mixing ratio of 1:1. Dioctyl diformate, high-purity Si powder with a mass fraction of 5%, and boron carbide powder with a mass fraction of 2%, followed by ball milling for 8 to 12 hours.
[0041] Step 2: Apply the high-purity SiC slurry formed in Step 1 evenly on the surface of the reaction sintered SiC substrate, and dry at room temperature to form a pre-coating layer.
[0042] Step 3: Sinter the pre-coating layer obtained in step 2 under an inert atmosphere at a heating rate of 2.5° C. / min, a sinte...
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