A kind of all-oxide flexible photodetector and its preparation method and application
A photodetector and oxide technology, applied in the field of microelectronics, can solve the problems of inability to realize large-area uniform preparation of flexible substrates, slow time response of ultraviolet photodetectors, and complicated preparation process, and achieve excellent ultraviolet photoelectric response performance, Zero power consumption, long-term stability and good repeatability
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[0040] The present invention also provides a method for preparing an all-oxide flexible photodetector, comprising the following steps:
[0041] (1) Cut the flexible substrate into a square of 2cm×2cm, and clean the cut substrate. The cleaning process is as follows: soak the substrate in acetone, ethanol, and deionized water for ultrasonication. 2 blow dry;
[0042] (2) Place the flexible substrate on the sample holder of the evaporation table, and fix the metal hard mask on the flexible substrate with a pressing pin. Put the sample holder into the growth chamber of the evaporation table, vacuumize the chamber, turn on the evaporation power supply, slowly increase the heating current of the evaporation power supply, conduct conductive electrode array deposition, and then take out the flexible substrate deposited with the conductive electrode array for use;
[0043] (3)SrCoO x Preparation of the thin film: transfer the flexible substrate deposited with the conductive electrode...
Embodiment 1
[0056] (1) Cut the flexible substrate into a square of 2cm×2cm, and clean the cut substrate. The cleaning process is as follows: Soak the substrate in acetone, ethanol, and deionized water for 10 minutes, take it out, and dry it with N 2 blow dry;
[0057] (2) Place the flexible substrate on the sample holder of the evaporation table, and fix the metal hard mask on the flexible substrate with a pressing pin. Put the sample holder into the sample cavity of the evaporation table, and vacuum the cavity until the pressure is less than 5×10 -4 Pa; turn on the Au evaporation power supply, slowly increase the heating current to 11.7A, and the deposition rate is The thickness of the deposited Au thin film electrode is 20nm, and the flexible substrate is taken out for use;
[0058] (3)SrCoO x Film preparation: Transfer the flexible substrate deposited with Au thin film electrodes to the sample stage of the pulsed laser sputtering deposition system, and put the sample stage into th...
Embodiment 2
[0067] (1) Cut the flexible substrate into a square of 2cm×2cm, and clean the cut substrate. The cleaning process is as follows: Soak the substrate in acetone, ethanol, and deionized water for 10 minutes, take it out, and dry it with N 2 blow dry;
[0068] (2) Place the flexible substrate on the sample holder of the evaporation table, and fix the metal hard mask on the flexible substrate with a pressing pin. Put the sample holder into the sample cavity of the evaporation table, and vacuum the cavity until the pressure is less than 5×10 -4 Pa; turn on the Ag evaporation power supply, slowly increase the heating current to 10.5A, and the deposition rate is The thickness of the deposited Ag thin film electrode is 40nm, and the flexible substrate is taken out for use;
[0069] (3)SrCoO x Film preparation: Transfer the flexible substrate deposited with Ag thin film electrodes to the sample stage of the laser sputtering deposition system, and put the sample stage into the growt...
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