Photoresist reworking liquid composition for CF process

A technology of composition and photoresist, which is applied in optics, photomechanical equipment, photosensitive material processing, etc., can solve the problems of high operating temperature, corrosion of conductive layer glass substrate, and long stripping time, and achieve low operating temperature and long stripping time. Short, strong peeling effect

Active Publication Date: 2020-09-08
福建省佑达环保材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Negative photoresist is used in the manufacturing process of color filters. After exposure, a cross-linking reaction occurs, making the cured photoresist more difficult to remove
The following problems exist in the above-mentioned published patents: poor peeling effect, long peeling time, high service temperature, large amount of foam, severe odor, short life, and corrosion to the conductive layer and the glass substrate

Method used

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  • Photoresist reworking liquid composition for CF process
  • Photoresist reworking liquid composition for CF process
  • Photoresist reworking liquid composition for CF process

Examples

Experimental program
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Effect test

Embodiment Construction

[0025] The present invention is described in detail below in conjunction with specific embodiment:

[0026] Described Gemini type surfactant structural formula is:

[0027]

[0028] When n=5, the specific preparation process is as follows: References: Zhang Chenglu, Song Fulu, Zhou Long, Han Zhen, Bai Ru, Yang Fan, Wang Nan, Sun Yuedong. Synthesis and properties of carboxylate gemini surfactant[ J]. Applied Chemistry, 2020,37(3):271-279.

[0029] Step 1: Synthesis of 2,2'-(ethane-1,2-dioxy)-dibenzoic acid (1)

[0030] In a 250mL three-neck round bottom flask, add salicylic acid (0.2mol), 80mL DMF and potassium hydroxide (0.5mol), stir until they are all dissolved, then raise the temperature to 50°C, and dropwise add 1,2-dibromoethyl Alkane (0.09mol), then warmed to 90°C. After the reaction was completed, cool to room temperature, add 100 mL of dilute hydrochloric acid (1 mol / L) and stir. Extracted with ethyl acetate (30mLx3), dried over anhydrous magnesium sulfate, evap...

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PUM

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Abstract

The invention discloses a photoresist reworking liquid composition for a CF process, and belongs to the field of wet electronic chemicals. The composition comprises the following components in percentage by weight: 0.5 to 40 percent of an inorganic alkaline substance, 0.5 to 45 percent of organic amine, 0.1 to 50 percent of a protic polar organic solvent, 0.1 to 50 percent of an aprotic polar organic solvent, 0.1 to 30 percent of a cyclic alcohol compound, 0.01 to 10 percent of a chemical formula A-Gemini type surfactant and the balance of water. The composition provided by the invention can be used for effectively removing bad photoresist on a glass substrate in the CF process, has the advantages of strong stripping performance, short stripping time, low operating temperature and the like, does not corrode substrate glass, has good dispersity on the photoresist, can reduce the blockage condition of a filter element to the greatest extent, and is small in volatility, low in foam, easyto rinse and free of environmental pollution.

Description

technical field [0001] The invention belongs to the field of wet electronic chemicals, is mainly used in the technical field of microelectronic materials, and relates to a photoresist rework liquid composition for CF process, which is used to quickly peel off the bad photoresist and its protective layer on the CF substrate, so that The stripped substrate can be reused. Background technique [0002] The development of TFT-LCD has gone through a long research stage. After realizing mass production and commercialization, TFT-LCD products are widely used in notebook computers, mobile phones, monitors and TVs due to their advantages of lightness, lightness, environmental protection and high performance. Various electronic products related to human life. Color filter is the key material for liquid crystal display to realize color. In addition to affecting color, CF also affects optical properties such as brightness and contrast of TFT-LCD. The technical development of color fil...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/425
Inventor 刘小勇李丛香房龙翔
Owner 福建省佑达环保材料有限公司
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