The invention discloses a photoresist reworking liquid composition for a CF process, and belongs to the field of wet electronic chemicals. The composition comprises the following components in percentage by weight: 0.5 to 40 percent of an inorganic alkaline substance, 0.5 to 45 percent of organic amine, 0.1 to 50 percent of a protic polar organic solvent, 0.1 to 50 percent of an aprotic polar organic solvent, 0.1 to 30 percent of a cyclic alcohol compound, 0.01 to 10 percent of a chemical formula A-Gemini type surfactant and the balance of water. The composition provided by the invention can be used for effectively removing bad photoresist on a glass substrate in the CF process, has the advantages of strong stripping performance, short stripping time, low operating temperature and the like, does not corrode substrate glass, has good dispersity on the photoresist, can reduce the blockage condition of a filter element to the greatest extent, and is small in volatility, low in foam, easyto rinse and free of environmental pollution.