Vertical near ultraviolet light-emitting diode and preparation method thereof
A technology of light-emitting diodes and light-emitting layers, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., and can solve the problems of weak electrode adhesion, easy falling off of wire-bonded electrodes, rough and poor interface surface conditions, etc.
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Embodiment 1
[0026] This embodiment provides a method for manufacturing a vertical near-ultraviolet light-emitting diode. The method manufactures a vertical near-ultraviolet light-emitting diode. The structure of the vertical near-ultraviolet light-emitting diode is as follows figure 1 Shown:
[0027] It includes:
[0028] Substrate 8
[0029] In this specific embodiment, the substrate is the base of the entire vertical structure LED chip, which is arranged at the bottom of the LED chip. The substrate is a copper / tungsten substrate, that is, a conductive substrate, and the conductive substrate is connected to the P electrode.
[0030] bonding layer 7
[0031] The bonding layer is disposed on the upper surface of the substrate, usually using a Ti / Au thin layer 7 .
[0032] mirror layer 6
[0033] The mirror layer is arranged on the upper surface of the bonding layer, and there is a luminescent layer above the mirror layer 6, and the light emitted from the luminescent layer is reflecte...
Embodiment 2
[0048] This embodiment 2 provides a method for preparing a light-emitting diode, and the method is used to manufacture the light-emitting diode as described in embodiment 1. In order to improve the manufacturing quality of the light emitting diode and improve the light extraction efficiency.
[0049] The method in the present embodiment 2 comprises the steps:
[0050] Step 1. Fabricate GaN epitaxial light-emitting layer
[0051] In this step, first grow a GaN epitaxial light-emitting layer on a sapphire substrate by metalorganic chemical vapor deposition, preferably sequentially comprising a u-GaN layer, an N-GaN layer, a multi-quantum well layer and a P-GaN layer; the above-mentioned manufacturing process can be It is formed by HMOCVD (High Temperature Vapor Chemical Deposition). Because it belongs to the prior art, it will not be expanded in detail in this embodiment.
[0052] Step 2. Make the mirror layer
[0053] In this step, the sapphire substrate can be first ground...
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