Non-doped solution-processable dendritic thermally activated delayed fluorescence electroluminescent diodes
A thermal activation delay, solution processing technology, applied in circuits, electrical components, electrical solid devices, etc., can solve the problems of efficiency roll-off, low start-up voltage, start-up voltage and unsatisfactory life, and improve the efficiency roll-off Severe, reduce the effect of selective energy level matching, fast and effective reverse intersystem crossing process
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Embodiment 1
[0045] The non-doped solution-processed dendritic thermally activated delayed fluorescent electroluminescent diode with low turn-on voltage, low efficiency roll-off and considerable device life in this embodiment consists of a substrate with an anode and a hole transport layer stacked in sequence , exciton blocking layer, light emitting layer, exciton blocking layer, electron transport layer, cathode buffer layer and cathode.
[0046] The luminescent layer is The hole transport layer is PEDOT:PSS, The exciton blocking layer between the hole transport layer and the light emitting layer is PVK, Exciton blocking layer T2T between the light emitting layer and the electron transport layer, Electron transport layer NBphen, Cathode buffer layer material CsF layer, Al as the cathode.
[0047] In order to reflect the superiority of the performance of the dendritic thermally activated delayed fluorescent light-emitting layer, the light-emitting layer P1 is used as a comparison,...
Embodiment 2
[0059] In this embodiment, the non-doped light-emitting layer material with a short excited state lifetime is replaced with T7, and other conditions are the same as in Embodiment 1.
[0060] The structure of T7 is
[0061] In this embodiment, the photoelectric performance test is carried out on the above-mentioned device, and the test process is the same as that in Embodiment 1.
[0062] In this embodiment, the transient fluorescence lifetime test is carried out on the above light-emitting layer film, and the test process is the same as that in Embodiment 1.
[0063] The current density-voltage-brightness curve, the external quantum efficiency-brightness curve of the non-doped solution-processed device (non-doped solution-processed type dendritic thermally activated delayed fluorescence electroluminescent diode) obtained in this embodiment, at 10 milliseconds The electroluminescence spectra, transient fluorescence lifetime spectra, and brightness-time decay curves at the cu...
Embodiment 3
[0069] The non-doped solution-processed dendritic thermally activated delayed fluorescence electroluminescent diode of this embodiment is composed of a substrate with an anode, a hole transport layer, a light emitting layer, an electron transport layer, a cathode buffer layer and a cathode stacked in sequence .
[0070] The luminescent layer is The hole transport layer is PEDOT:PSS, Electron transport layer TPBi, Cathode buffer layer material CsF layer, Al as the cathode.
[0071] In order to reflect the superiority of the performance of the dendritic thermally activated delayed fluorescent light-emitting layer, the light-emitting layer P1 is used as a comparison, and the structural formula of P1 is as follows:
[0072]
[0073] Preparation method of non-doped solution-processed thermally activated delayed fluorescence electroluminescent diode:
[0074] Take a number of ITO conductive glass substrates with the same batch number, the size is 15 mm × 15 mm, the thickne...
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Abstract
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