Preparation process of high-power unipolar pulse magnetron sputtering CrSiCN film

A preparation process, unipolar pulse technology, applied in sputtering plating, metal material coating process, ion implantation plating and other directions, to achieve the effect of dense coating, excellent wear resistance and corrosion resistance, and good bonding force

Inactive Publication Date: 2020-11-10
HAMA NAKA MOTOGAWA METAL PROD KUNSHAN
View PDF2 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, with the advancement of technology and the requirements for the surface properties of materials, the gun-colored

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Preparation process of high-power unipolar pulse magnetron sputtering CrSiCN film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] Embodiment 1 A kind of preparation technology of high-power unipolar pulse magnetron sputtering CrSiCN film comprises the following steps:

[0047] 1. Preparation:

[0048] 3 Cr flat targets, 1 Si flat target and 4 Cr arc targets are installed on the vacuum coating machine; the workpiece is degreased by ultrasonic wave and cleaned with pure water, and the cleaned workpiece is dried and fixed on the turntable in the coating chamber , evacuate the coating chamber and turn on the turret to rotate, then turn on the heater to preheat the workpiece at a speed of 480r / min;

[0049] 2. Glow cleaning:

[0050] Vacuum the coating chamber to 2×10 -2 Pa, and raise the temperature to 180°C for glow cleaning, then pass argon gas with a flow rate of 400 sccm, turn on the bias power supply to 550V for 25 minutes, and continue vacuuming to 6×10 -3 Pa, and then the coating deposition process

[0051] 3. Coating precipitation:

[0052] (31) Deposition of the base ion plating film (Cr...

Embodiment 2

[0058] Embodiment 2 A preparation process of high-power unipolar pulse magnetron sputtering CrSiCN film, comprising the following steps:

[0059] 1. Preparation:

[0060] 3 Cr flat targets, 1 Si flat target and 4 Cr arc targets are installed on the vacuum coating machine; the workpiece is degreased by ultrasonic wave and cleaned with pure water, and the cleaned workpiece is dried and fixed on the turntable in the coating chamber , evacuate the coating chamber and turn on the turret to rotate, then turn on the heater to preheat the workpiece at a speed of 720r / min;

[0061] 2. Glow cleaning:

[0062] Vacuum the coating chamber to 4×10 -2 Pa, and raise the temperature to 220°C for glow cleaning, then pass argon gas with a flow rate of 600 sccm, turn on the bias power supply to 650V for 35 minutes, and continue to vacuumize to 8×10 -3 Pa, and then the coating deposition process

[0063] 3. Coating precipitation:

[0064] (31) Deposition of the base ion plating film (Cr): fee...

Embodiment 3

[0069] Embodiment 3 A preparation process of high-power unipolar pulse magnetron sputtering CrSiCN film, comprising the following steps:

[0070] 1. Preparation:

[0071] 3 Cr flat targets, 1 Si flat target and 4 Cr arc targets are installed on the vacuum coating machine; the workpiece is degreased by ultrasonic wave and cleaned with pure water, and the cleaned workpiece is dried and fixed on the turntable in the coating chamber , evacuate the coating chamber and turn on the turret to rotate, then turn on the heater to preheat the workpiece at a speed of 500r / min;

[0072] 2. Glow cleaning:

[0073] Vacuum the coating chamber to 3×10 -2 Pa, and raise the temperature to 200°C, perform glow cleaning, then pass argon gas, the flow rate is 500sccm, turn on the bias power supply to 600V for 30 minutes, and continue to vacuumize to 7×10 -3 Pa, and then the coating deposition process

[0074] 3. Coating precipitation:

[0075] (31) Deposition of the base ion plating film (Cr): a...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a preparation process of a high-power unipolar pulse magnetron sputtering CrSiCN film, and relates to the technical field of substrate material surface coating. The preparationprocess comprises the steps that in the coating precipitation step, firstly, bottoming ion coating (Cr) deposition is carried out; then, transition layer (CrN) deposition is carried out; and finally,composite layer (CrSiCN) deposition is carried out. The flow ratio of argon and nitrogen is controlled in the deposition step of the transition layer (CrN), the flow ratio of argon, nitrogen and acetylene is controlled in the deposition step of the composite layer (CrSiCN), and the thickness ratio of the three coatings is reasonably controlled to be 1: 1: 5, so that the coatings are tightly combined with the surface of a base body and have excellent wear resistance and corrosion resistance, and the prepared coatings are more compact; and the film is smooth in surface, good in crystallinity andhigh in hardness.

Description

technical field [0001] The invention relates to the technical field of film coating on the surface of substrate materials, in particular to a preparation process of high-power unipolar pulse magnetron sputtering CrSiCN film. Background technique [0002] With the development of society and the advancement of industrial technology, the industrial field has put forward higher and higher requirements for the performance of materials. In many engineering applications, materials are required to have excellent comprehensive properties, not only high hardness and corrosion resistance, It is also required to have excellent wear resistance. In order to meet the increasingly complex and diverse engineering needs to apply a layer of coating on the surface of materials to improve the comprehensive performance of materials, functional coatings have emerged as the times require. The protective coating can improve the surface properties of the material, and can effectively improve the sur...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/0641C23C14/3485C23C14/352
Inventor 蔡俊信
Owner HAMA NAKA MOTOGAWA METAL PROD KUNSHAN
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap