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Quartz glass plate

A quartz glass and glass plate technology, applied in glass forming, glass manufacturing equipment, cleaning methods and utensils, etc., can solve the problems of spacing deviation, difficult to control height, difficult to handle, etc., and achieve the effect of uniform step difference

Active Publication Date: 2020-12-04
SHIN ETABU QUARTZ PRODS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this method is difficult to control the height of the step, and when UV treatment is performed, the distance between the object to be treated and the UV light source will vary, making it difficult to process uniformly

Method used

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  • Quartz glass plate
  • Quartz glass plate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-1

[0042] Through the following process, manufacturing figure 1 The quartz glass plate 10 shown is provided as a quartz glass plate for ultraviolet radiation glazing.

[0043] First, 10 g of silica particles (average particle diameter: 1.5 μm, total concentration of Li, Na, K, and Ca: 4 mass ppm) were introduced into 1.5 g of a solution obtained by hydrolyzing tetraethoxysilane. Then, stirring was performed for 1 minute using a stirrer to obtain a silica slurry.

[0044] Next, the above-mentioned silica slurry was coated on the polished quartz glass plate main body 11 (synthetic quartz glass plate) of 300 mm×300 mm×5 mm in thickness. Then, a 5 mm square x 200 mm quartz glass member 12 (quartz glass strip plate) was placed on the quartz glass plate body 11, and a 2 gf / mm 2 (about 0.2N / mm 2 ) load, directly stand for 1 hour. Here, two quartz glass members 12 (quartz glass strip plates) were used and bonded to two places on the quartz glass plate main body 11 . Then, the oozing...

Embodiment 1-2

[0047] Basically, the quartz glass plate 10 (quartz glass plate for ultraviolet irradiation windows) was obtained in the same manner as in Example 1-1, but compared with Example 1-1, the total concentration of Li, Na, K, and Ca was used. Silica particles of 6 mass ppm were used as the raw material. To make the total irradiation energy reach 1000kJ / cm 2 In this way, the quartz glass plate 10 (quartz glass plate for ultraviolet irradiation windows) manufactured in this way was irradiated with an excimer light having a wavelength of 172 nm.

Embodiment 1-3

[0049] Basically, the quartz glass plate 10 (quartz glass plate for ultraviolet irradiation windows) was obtained in the same manner as in Example 1-1, but compared with Example 1-1, the total concentration of Li, Na, K, and Ca was used. The silica particles used as the raw material were 8 mass ppm of silica particles. To make the total irradiation energy reach 1000kJ / cm 2 In this way, the quartz glass plate 10 (quartz glass plate for ultraviolet irradiation windows) manufactured in this way was irradiated with an excimer light having a wavelength of 172 nm.

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Abstract

The present invention is a quartz glass plate comprising a quartz glass plate main body, and a quartz glass member adhered via an adhesive layer to the quartz glass plate main body. In this quartz glass plate, the adhesive layer comprises silica, and the sum of the concentrations of Ca ions, which are alkaline earth metal ions, and Li, Na, and K ions, which are alkali metal ions, included in the adhesive layer, is 10 ppm by mass or lower. Provided in this manner is a quartz glass plate that allows a level difference of a uniform thickness to be formed, and that is not readily damaged by the irradiation of light comprising UV radiation.

Description

technical field [0001] The invention relates to a quartz glass plate. Background technique [0002] In the photolithography process of semiconductor manufacturing, patterning is performed by exposing a silicon wafer coated with a photoresist to light. If there is damage or the like on the mask used at this time, defects will appear in the pattern at the time of exposure, so in order to prevent this, a pellicle is usually mounted on the mask. The pellicle plate in the pellicle is used in a form fixed to a frame-shaped frame with an adhesive. In recent years, the refinement of lithography has also been continuously developed, and ultraviolet rays with shorter wavelengths and higher energy are gradually being used. Regarding frames and adhesives, they are also gradually required to be high heat resistance and UV resistance. Material. Furthermore, when a pellicle is attached to the mask and the exposure is performed, if the optical path length of the light used for exposure c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C27/10C03B20/00G03F1/62
CPCC03C27/10G03F1/64G03F1/62C03C4/0085C03C3/06C03C2201/02B08B7/0057C03B20/00H01L21/027C03C8/24
Inventor 森龙也佐藤彰嶋田敦之横泽裕也吉田宜正
Owner SHIN ETABU QUARTZ PRODS