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Nanopore array based on Marangoni convection control, controllable machining method and application thereof

A nano-hole array and processing method technology, which is applied in nanotechnology, nanotechnology, nanostructure manufacturing and other directions, can solve the problems of large process test workload and difficult adjustment of hole positions, and achieves overcoming large process test workload and uniform precision. Effect

Inactive Publication Date: 2020-12-15
GUANGDONG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method overcomes the shortcomings of the current nanohole array etching technology, such as the heavy process test workload and the difficulty in adjusting the hole position.

Method used

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  • Nanopore array based on Marangoni convection control, controllable machining method and application thereof
  • Nanopore array based on Marangoni convection control, controllable machining method and application thereof
  • Nanopore array based on Marangoni convection control, controllable machining method and application thereof

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Embodiment 1

[0036] figure 1 It is a schematic flowchart of the controllable processing method of the nanopore array based on Marangoni convection control in the present invention. image 3 It is a schematic diagram of the process of processing a controllable nanopore array based on Marangoni interfacial convection in the present invention. Such as figure 1 and 3 As shown, a controllable processing method of a nanopore array based on Marangoni convection manipulation, including the following steps:

[0037] 1. First use ethanol and deionized water to ultrasonically clean at 50-60°C for 5 minutes to remove impurities on the silicon substrate 105, such as image 3 Shown in (a); Then on the silicon substrate 105, the nanohole array mask 104 of required specific spacing and aperture is processed by photolithography, as image 3 Shown in (b). The thickness of the mask plate 104 should be less than or equal to the diameter of the catalytic noble metal particles 103, so that the particles fa...

Embodiment 2

[0046] The difference from Example 1 is that: the distance between the glass slide and the silicon substrate described in step 2 is 250 μm; the suspension mixture is an aqueous ethanol solution containing platinum particles 103 with a particle size of 7 nm; the volume of the suspension mixture is 40 μL, The volume ratio of ethanol and water is 1:4; the concentration of platinum nanoparticles is 4mg / mL -1 . The preheating temperature in step 3 is 50° C., and the heating time is 1 min. The soaking time described in step 5 is 3min. The volume of etching solution 201 described in step 6 is 0.5ml (HF and H 2 o 2 The volume ratio is 4:1). The etching time in step 7 is 3 minutes, the pitch of the nanohole array is 10 nm, and the diameter of the nanoholes is 8 nm.

[0047] figure 2 It is a schematic diagram of the principle of processing controllable nanopore array based on Marangoni interfacial convection in the present invention. From figure 2 As can be seen in , the devic...

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Abstract

The invention belongs to the technical field of micro-nano machining, and discloses a nanopore array based on Marangoni convection control, a controllable machining method and application thereof. Themethod comprises the following steps of: photoetching a nanopore array mask plate with required spacing and pore diameter on a cleaned silicon substrate, dripping a suspension mixed solution on the silicon substrate with the mask plate, then putting the silicon substrate covered with a glass slide on a preheating plate, adjusting the temperature to 50-80DEG C, performing heating to generate Marangoni interface convection, driving noble metal particles to flow to a mask plate region, performing observing through a CCD (Charge Coupled Device) observation mirror until the mask plate array regionis filled with the noble metal particles; taking out the silicon substrate, taking off the slide glass, removing the surface mask, and performing flushing to obtain a noble metal nanoparticle array with a regular silicon wafer surface; and then dropwise adding an etching solution, and performing cleaning to remove the etching solution and the noble metal nanoparticles to obtain the nanopore array. According to the method, the defects of large process test workload, difficult hole position adjustment and the like required by the conventional nanopore array etching technology are overcome.

Description

technical field [0001] The invention belongs to the technical field of micro-nano processing, and more specifically relates to a nanohole array based on Marangoni convection control and a controllable processing method and application thereof. Background technique [0002] In recent years, with the development of nanoscience and technology, solid-state nanopores have been widely used in gene sequencing, energy conversion and other fields due to their stable performance, controllable geometry, and good robustness. Single-hole nanopore processing technology is relatively mature at present, but nanopore arrays for commercial applications such as gene sequencing still face problems such as high processing cost, low efficiency, and poor controllability. [0003] There are three main processing methods for existing solid-state nanopores: one is metal-assisted chemical etching processing. Before chemical etching, metal particles must be self-assembled and deposited on the substrat...

Claims

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Application Information

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IPC IPC(8): B82B3/00B82B1/00B82Y40/00
CPCB82B3/0014B82B1/00B82Y40/00
Inventor 姚瑶陈云侯茂祥陈燕辉施达创陈新高健
Owner GUANGDONG UNIV OF TECH