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A kind of nano-imprint template and its preparation method and application

A nano-imprinting and template technology, which is applied in the field of nanotechnology, can solve the problems of low imprinting success rate and poor uniformity of stress distribution in the micro-area of ​​the imprinting template, so as to improve the yield of imprinting and improve the uniformity of stress distribution in the micro-area , The effect of broadening the scope of the application structure

Active Publication Date: 2022-07-12
THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the use of the template, the uniformity of stress distribution in the micro-area of ​​the imprint template / imprint adhesive interface is poor, and the success rate of a single large-area imprint is low

Method used

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  • A kind of nano-imprint template and its preparation method and application
  • A kind of nano-imprint template and its preparation method and application
  • A kind of nano-imprint template and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0085] The present embodiment provides a nano-imprint template, a preparation method thereof, and a nano-imprint method, which are as follows:

[0086] (1) Coating an adhesion promoter with a thickness of 10 nm on the silicon substrate, and then spin-coating a negative electron beam resist with a thickness of 350 nm, using a beam spot diameter of 5 nm and a dose of 300 μC / cm 2 The electron beam resist was exposed, developed and fixed with tetramethylammonium hydroxide solution and water, respectively, the samples were blown dry with nitrogen, and the samples were baked at 85 °C for 1 min.

[0087] (2) Oxygen plasma enhanced reactive ion etching was used to remove the electron beam resist pattern primer, and the etching time was 20s. Then use the negative electron beam resist pattern as a mask to etch the silicon substrate: the temperature of the stage is set to -110 ° C, and the gas SF is introduced. 6 and O 2 , the flow rate is 30sccm and 20sccm respectively, the power of t...

Embodiment 2

[0092] The present embodiment provides a nano-imprint template, a preparation method thereof, and a nano-imprint method, which are as follows:

[0093] (1) A positive electron beam resist with a thickness of 170 nm was spin-coated on a silicon substrate, using a beam spot diameter of 5 nm and a dose of 1000 μC / cm 2 The electron beam resist was exposed, developed and fixed to obtain a nanoarray pattern.

[0094] (2) A silicon oxide film with a thickness of 50 nm was evaporated on the electron beam resist pattern by the electron beam evaporation process, and the deposition rate was Then, the silicon substrate is placed in an acetone solution to perform a lift-off process to obtain a silicon oxide thin film pattern opposite to the exposure pattern.

[0095] (3) Using the silicon oxide film as a mask, the silicon substrate is etched: the temperature of the stage is set to -110°C, and the gas SF is introduced. 6 and O 2 , the flow rate is 30sccm and 12sccm, the power of the lower...

Embodiment 3

[0100] The present embodiment provides a nano-imprint template, a preparation method thereof, and a nano-imprint method, which are as follows:

[0101] (1) A positive electron beam resist with a thickness of 170 nm was spin-coated on a silicon substrate, using a beam spot diameter of 5 nm and a dose of 250 μC / cm 2 The electron beam resist was exposed, and the exposure pattern was the inverse pattern of Examples 1 and 2, and the nanoarray pattern was obtained after developing and fixing.

[0102] (2) Using the positive electron beam resist pattern as a mask, the silicon substrate is etched: the temperature of the stage is set to -110°C, and the gas SF is introduced. 6 and O 2 , the flow rate is 30s ccm and 15sccm, the lower electrode power is 5W, and the etching time is 35s. The e-beam resist is removed to obtain a silicon template structure (such as Figure 7a shown).

[0103] (3) Using optical exposure and dry etching technology to prepare a through channel structure of s...

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Abstract

The invention relates to a nano-imprint template, a preparation method and application thereof. The nano-imprint template comprises a rigid bearing backplane, an elastic layer and a rigid template layer which are stacked in sequence; the rigid template layer includes at least two a non-contact imprinting module, the imprinting module includes a first template layer and a second template layer arranged in layers, the second template layer is close to the elastic layer; direction, the projected area of ​​the first template layer is smaller than the projected area of ​​the second template layer; the first template layer is provided with an embossed pattern area, and there is a through-channel structure around the imprinted pattern area. Stress differentiation zone. The stress differentiation area is used to adjust the compressive stress of the pattern area during the imprinting process. The nano-imprint template provided by the invention significantly improves the uniformity of stress distribution in the micro-region of the imprint template / imprint glue interface and the tolerance of stress and strain between modules, thereby significantly improving the success rate of single large-area imprinting.

Description

technical field [0001] The invention relates to the technical field of nanotechnology, in particular to a nanoimprint template and a preparation method and application thereof. Background technique [0002] Nanoimprinting technology, developed since the 1990s, is considered to be one of the most promising nanofabrication and manufacturing technologies due to its advantages of high resolution, low cost, and batch fabrication. Nanoimprint technology is to use a template with nanopatterns to press the pattern on the substrate coated with imprint glue under the action of mechanical force. It is characterized by no resolution limitation caused by optical diffraction, but it has the processing ability comparable to optical exposure, and the equipment is simple and easy to operate, so it is expected to be used in industrial production. [0003] According to the curing method of the embossing glue, nano-imprinting is mainly divided into thermal imprinting and ultraviolet imprinting...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 陈佩佩褚卫国田毅黄辉徐丽华徐陶然
Owner THE NAT CENT FOR NANOSCI & TECH NCNST OF CHINA
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