Surface treatment method of graphite substrate and preparation method of TaC coating

A technology for graphite substrate and surface treatment, which is applied to the surface treatment method and the preparation of TaC coating, the surface treatment for improving the bonding strength of graphite substrate and TaC coating, and the high-strength bonding field of graphite substrate and TaC coating, which can solve the production cost Low production cycle, short production cycle and other problems, to achieve the effect of short production cycle, strong interface enhancement, and tight integration

Active Publication Date: 2021-02-19
湖南中科顶立技术创新研究院有限公司 +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Based on the above-mentioned technical problems existing in the prior art, the present invention adopts the method of oxygen plasma or argon plasma bombardment to simultaneously improve the roughness and activity of the graphite substrate surface, to solve the problem of interfacial bonding strength between the graphite substrate and the TaC coating , the process is simple and efficient, low energy consumption, low production cost and short production cycle

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  • Surface treatment method of graphite substrate and preparation method of TaC coating
  • Surface treatment method of graphite substrate and preparation method of TaC coating
  • Surface treatment method of graphite substrate and preparation method of TaC coating

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Embodiment 1

[0033] The present embodiment provides a kind of surface treatment method that improves the bonding strength of graphite substrate and TaC coating, specifically as follows:

[0034]Clean and dry the graphite substrate, put it into the reaction chamber of the oxygen plasma modification equipment, close the inlet valve of the reaction chamber, evacuate the reaction chamber, then pass in oxygen to fill the reaction chamber, then evacuate, and then fill with oxygen , repeat the steps of inflating and vacuuming twice, finally adjust the inlet valve to stabilize the vacuum degree in the reaction chamber below 50Pa, start the discharge of the radio frequency power supply, the frequency is 13.56Mhz, the power is 1kW, and the oxygen plasma is bombarded on the surface of the graphite substrate. The processing time is 7 minutes; the RF power is turned off, and the surface treatment of the graphite substrate is completed.

[0035] In this embodiment, argon plasma can also be used to bomba...

Embodiment 2

[0038] This embodiment provides a method for high-strength bonding of a graphite substrate and a TaC coating, such as figure 1 , including the following steps:

[0039] S1, graphite substrate is processed through the mode of embodiment 1;

[0040] S2. Put the graphite substrate treated with oxygen plasma into a chemical vapor deposition furnace, evacuate to below 50Pa, and turn on the circulating cooling water to cool the vacuum pump group and the furnace body of the chemical vapor deposition furnace to achieve To protect the furnace body, raise the temperature of the deposition furnace to 1300°C with a heating rate of 5°C / min; when the vapor deposition furnace reaches 1300°C, the 3 h 6 (or CH 4 or C 2 h 6 or C 2 h 2 ), TaCl 5 、H 2 and the mixed gas composed of carrier gas Ar gas to deposit TaC coating, and adjust the deposition thickness by controlling the deposition time. The thickness of the TaC coating prepared in this embodiment is 20-300 μm; wherein, the Ar gas ...

Embodiment 3

[0044] This embodiment provides a method for high-strength bonding of a graphite substrate and a TaC coating, which specifically includes the following steps:

[0045] S1, graphite substrate is processed through the mode of embodiment 1;

[0046] S2. Put the graphite substrate treated with oxygen plasma into a chemical vapor deposition furnace, evacuate to below 50Pa, turn on the circulating cooling water, and raise the temperature of the deposition furnace to 1000°C with a heating rate of 2°C / min; After the furnace reaches 1000°C, pass through the 3 h 6 , TaCl 5 、H 2 and the mixed gas composed of carrier gas Ar gas to deposit TaC coating, and adjust the deposition thickness by controlling the deposition time. The thickness of the TaC coating prepared in this embodiment is 100 μm; wherein, the Ar gas flow rate is 1000ml / min, H 2 The flow rate is 300ml / min, C 3 h 6 The flow rate is 20ml / min, and the furnace pressure in the vapor deposition furnace is maintained at 1000Pa;...

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Abstract

The invention discloses a surface treatment method of a graphite substrate and a preparation method of a TaC coating, and the surface treatment method comprises the following steps: cleaning and drying the graphite substrate, putting the graphite substrate into a reaction chamber of plasma modification equipment, closing an air inlet valve, vacuumizing the reaction chamber, and then introducing oxygen or argon to fill the reaction chamber; adjusting the air inlet valve to stabilize the vacuum degree of the reaction chamber at 10-100Pa, starting to discharge a radio frequency power supply, andperforming oxygen plasma or argon plasma to bombard the surface of the graphite substrate so as to increase the roughness of the surface of the graphite substrate and improve the activity of the surface of the graphite substrate; and performing TaC coating deposition after treatment by the method. The formed TaC coating can be tightly combined with a graphite substrate and is not easy to fall off,and the thermal shock resistance is greatly improved; and the process is simple, efficient, low in energy consumption, low in production cost and short in production period.

Description

technical field [0001] The invention relates to the technical field of surface treatment of graphite substrates, in particular to a method for surface treatment of graphite substrates and a method for preparing TaC coatings; more specifically, to a surface treatment method for improving the bonding strength of graphite substrates and TaC coatings and graphite substrates. A method for high-strength bonding of the substrate to the TaC coating. Background technique [0002] Graphite is a lightweight material with a high melting point, suitable for high temperature environments, but it is prone to react with other substances at high temperatures, so it is necessary to prepare a dense protective coating on its surface. Faced with the increasingly harsh environment, the requirements for coatings are also getting higher and higher. As a high-temperature ceramic material with an ultra-high melting point, excellent chemical stability, and good chemical compatibility with carbon mater...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C04B41/87C04B41/91
CPCC04B41/5057C04B41/87C04B41/009C04B41/53C04B41/5315C04B41/91C04B35/522C04B41/4531
Inventor 戴煜吴建易君
Owner 湖南中科顶立技术创新研究院有限公司
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