Inverted organic light-emitting diode device and preparation method thereof
An electroluminescent device, an organic technology, applied in the direction of organic semiconductor devices, electric solid devices, semiconductor/solid device manufacturing, etc., can solve the problems of low efficiency and high driving voltage
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Embodiment 1
[0051] In this embodiment, an inverted organic electroluminescent device includes an ITO substrate, a doped electron injection layer, an energy level matching layer, a hole blocking layer, a light emitting layer, a hole transport layer, a hole injection layer and an anode layer; the doped electron injection layer is SnO doped with tin dioxide nanoparticles by cesium fluoride particles 2 : CsF composite material layer; in the doped electron injection layer, the doping mass percentages of the cesium fluoride particles are respectively 3%, 5% and 10%; the annealing temperature of the doped electron injection layer is 150 ° C; the thickness of the doped electron injection layer is 30 nm.
[0052] In this embodiment, the method for preparing an inverted organic electroluminescent device in this embodiment includes the following steps:
[0053] S1.ITO substrate pretreatment:
[0054] Clean and dry the ITO substrate to obtain the processed ITO substrate; the pretreatment process of...
Embodiment 2
[0071] This embodiment is basically the same as Embodiment 1, and the special features are:
[0072] In this embodiment, an inverted organic electroluminescent device includes an ITO substrate, a doped electron injection layer, an energy level matching layer, a hole blocking layer, a light emitting layer, a hole transport layer, a hole injection layer and an anode layer; the doped electron injection layer is SnO doped with tin dioxide nanoparticles by cesium fluoride particles 2 : CsF composite material layer; in the doped electron injection layer, the doping mass percentage of the cesium fluoride particles is 5%; the annealing temperature of the doped electron injection layer is respectively 120 ℃ and 180 ℃; the The thickness of the doped electron injection layer is 30nm.
[0073] In this embodiment, the method for preparing an inverted organic electroluminescent device in this embodiment includes the following steps:
[0074] S1.ITO substrate pretreatment:
[0075] Clean ...
Embodiment 3
[0100] This embodiment is basically the same as the previous embodiment, and the special features are:
[0101] In this embodiment, an inverted organic electroluminescent device includes an ITO substrate, a doped electron injection layer, an energy level matching layer, a hole blocking layer, a light emitting layer, a hole transport layer, a hole injection layer and an anode layer; the doped electron injection layer is SnO doped with tin dioxide nanoparticles by cesium fluoride particles 2 : CsF composite material layer; in the doped electron injection layer, the doping mass percentage of the cesium fluoride particles is 5%; the annealing temperature of the doped electron injection layer is respectively 150 ° C; the doped The thickness of the type electron injection layer was 25 nm.
[0102] In this embodiment, the method for preparing an inverted organic electroluminescent device in this embodiment includes the following steps:
[0103] S1.ITO substrate pretreatment:
[01...
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