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Preparation method of water-soluble tantalum solution

A water-soluble, water-soluble technology, applied in electrodes, electrolysis process, electrolysis components, etc., can solve the problems of affecting coating quality, increasing production cost, exceeding the standard, etc., to achieve the effect of reducing production cost, enhancing long life and good safety.

Inactive Publication Date: 2021-02-26
王庆琨
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  • Application Information

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Problems solved by technology

This method reaction will increase the production cost by reacting at high temperature, and the use of raw materials containing potassium (sodium) ions will cause potassium (sodium) ions to exceed the standard, which will affect the quality of the coating. In addition, oxalic acid or citric acid has certain reducing properties. , when the coating solution is configured with the chloroiridium (IV) acid solution, the iridium (IV) is reduced to iridium (III), and the final coating contains Ir 2 o 3 , seriously affect the performance of the coating

Method used

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preparation example Construction

[0025] A kind of preparation method of water-soluble tantalum solution, flow process is as follows figure 1 As shown, follow the steps below:

[0026] Using tantalum pentachloride n-butanol solution with a tantalum content of 200g / L as the starting material, the tantalum pentachloride is hydrolyzed to generate tantalum hydroxide solid by adding aqueous sodium hydroxide solution, and the tantalum hydroxide solid is added to the volume concentration of 20% In the acetic acid solution, add oxalic acid and heat, add dropwise 30% hydrogen peroxide solution until the solution is transparent, and concentrate to the specified concentration.

[0027] Wherein, the pH value of aqueous sodium hydroxide solution is 12-14, and the volume ratio of aqueous sodium hydroxide solution and tantalum pentachloride n-butanol solution is (2-1): 1, and reaction temperature is room temperature, and the time is 15-30 minutes; Tantalum hydroxide (g): 20% acetic acid solution (mL): oxalic acid (g) = 1: (...

Embodiment 1

[0032]In an ordinary workshop, the n-butanol solution of tantalum pentachloride with a tantalum content of 200g / L is used as the starting material, and the tantalum pentachloride is hydrolyzed to generate tantalum hydroxide solid by adding an aqueous solution of sodium hydroxide with a pH value of 12. The volume ratio of sodium hydroxide aqueous solution to tantalum pentachloride n-butanol solution is 1:1, the reaction temperature is room temperature, and the time is 15 minutes; then the tantalum solid is added to the acetic acid solution with a volume concentration of 20%, and then oxalic acid is added After heating, add 30% hydrogen peroxide solution dropwise until the solution is transparent, wherein tantalum hydroxide (g): 20% acetic acid solution (mL): oxalic acid (g) = 1:20:4; oxalic acid (g): 30% hydrogen peroxide (mL )=1:10, the reaction temperature is 100°C, the time is 1 hour, concentrated to obtain a water-soluble tantalum solution with a tantalum content of 10%, and...

Embodiment 2

[0034] In an ordinary workshop, the n-butanol solution of tantalum pentachloride with a tantalum content of 200g / L is used as the starting material, and the tantalum pentachloride is hydrolyzed to generate tantalum hydroxide solid by adding an aqueous solution of sodium hydroxide with a pH value of 14. The volume ratio of sodium hydroxide aqueous solution to tantalum pentachloride n-butanol solution is 2:1, the reaction temperature is room temperature, and the time is 30 minutes; then the tantalum solid is added to the acetic acid solution with a volume concentration of 20%, and then oxalic acid is added After heating, add 30% hydrogen peroxide solution dropwise until the solution is transparent, wherein tantalum hydroxide (g): 20% acetic acid solution (mL): oxalic acid (g) = 1:25:8; oxalic acid (g): 30% hydrogen peroxide (mL )=1:30, the reaction temperature is 110°C, and the time is 1.5 hours. After concentration, a water-soluble tantalum solution with a tantalum content of 10...

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Abstract

The invention provides a preparation method of a water-soluble tantalum solution, which comprises the steps of by using an n-butyl alcohol solution of tantalum pentachloride as a starting raw material, adding a sodium hydroxide aqueous solution to hydrolyze tantalum pentachloride to generate a tantalum hydroxide solid, adding the tantalum hydroxide solid into an acetic acid solution with the volume concentration of 20%, adding oxalic acid, heating, dropwise adding a 30% hydrogen peroxide solution until the solution is transparent, and finally concentrating to a specified concentration. The invention aims to provide a preparation method of the water-soluble tantalum solution, a coating solution obtained after the solution is mixed with chloroiridic acid is good in performance and good in preparation safety, the preparation method is suitable for industrial production, and the production cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of anode coatings, in particular to a method for preparing a water-soluble tantalum solution. Background technique [0002] With the development of the chlor-alkali industry, the requirements for dimensional stability of the anode continue to increase, and the titanium-based ruthenium-containing coating is resistant to RuO 2 RuO is formed under the action of oxygen 4 , Continuously dissolved, resulting in the loss of active substances. IrO 2 The oxygen evolution overpotential of RuO 2 High, the working life in strong acid is much longer than the latter. Comprehensive consideration, IrO 2 It is an ideal active component of oxygen evolution electrode coating. Ta 2 o 5 It is a substance with strong chemical stability. Studies have shown that it has a protective effect on active substances as an inert component of the coating (Appl. Eletrochem., 1994 (24): 1262-1266). [0003] The preparation of tantal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C25B1/34C25B11/093
CPCC25B1/34
Inventor 王庆琨杨机妹
Owner 王庆琨
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