Preparation method of alkali-free boroaluminosilicate glass

Abstract

The invention relates to a preparation method of alkali-free boroaluminosilicate glass, which is characterized by comprising the steps of (1) weighing the following batch raw materials in percentage by mass: 58-70% of SiO2, 3-10% of B2O3, 12-18% of Al2O3, 10-15% of MgO, 1-3% of CaO, 2-4% of SrO, 0.1-1% of ZrO2, 0.1-0.2% of SnO and 0.01-0.5% of In2O3, wherein the value of RO (MgO+CaO+SrO) is 13%-18%; (2) mixing the glass batch raw materials, a binder and water according to a mass ratio of (35-60): (1-6): (35-60) to form slurry, adding the slurry into a spray granulator, and adjusting the air inlet temperature to 200-230 DEG C, the air blower frequency to 25-35 HZ and the induced draft fan frequency to 35-45 HZ to prepare 100-500 [mu]m batch particles; and (3) melting and clarifying the batch particles in a high-temperature furnace, molding and annealing. The beneficial effects are that the prepared batch is low in particle density, small and uniform in particle size, good in flowabilityand small in resistance in the feeding process, the batch is prepared into batch particles, then melting is conducted, and the melting time of glass can be shortened.

Description

technical field [0001] The invention relates to the technical field of electronic glass, in particular to a method for preparing alkali-free boroaluminosilicate glass. Background technique [0002] With the rapid development of flat panel information display technology, TFT-LCD (Thin Film Transistor Liquid Crystal Display) technology is widely used in LCD TVs, tablet computers, smart phones, and vehicle displays due to its advantages such as high definition, small size, and good environmental performance. In fields such as industry 4.0 and the upgrading of living standards, emerging industries such as wearable electronic products, artificial intelligence, and smart cities are bound to develop rapidly, which also brings new development opportunities for TFT-LCD technology. As one of the key basic materials of the liquid crystal display industry, TFT-LCD substrate glass has a huge impact on the performance of display products. [0003] Due to the special performance requireme...

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Problems solved by technology

[0003] Due to the special performance requirements of TFT-LCD substrate glass, there is no alkali metal oxide in the glass batch material, and the alumina content is high, resulting in high viscosity and difficult bubble removal during the glass melting process.

In order to achieve clarification and homogenization of glass, it is necessary to add a large amount of clarifier or increase the temperature of the furnace, but this will undoubtedly affect the performance of the glass (transmittance, refractive index, etc.), and the energy consumption will increase and the cost will increase.

At the same time, the powder is easy to produce "dust" effect when feeding, resulting in a poor working environment; and the temperature of the batch material rises rapidly in the high-temperature furnace, and some low-melting components do not participate in the glass formation reaction and volatilize and erode the furnace body, resulting in long life of the furnace. shorten

[0004] At present, in the prior art, the problems of clarification and "dusting" are mostly solved by pretreatment of batch materials and improvement of batch material components; for example, a composition for alkali-free aluminosilicate glass is disclosed in the patent publication number CN 105731790 . Alkali-free aluminosilicate glass and its preparation method and application, in which the glass melting temperature is low and the glass network structure is single (no B 2 o 3 ), leading to a decrease in the optical properties of the glass and a long melting time; the patent publication No. CN103102057 discloses a pretreatment method of mixing the batch material with water and standing for more than 72 hours, and then briquetting and balling after hydration and hardening. This method has a long cycle, and it is difficult to control the particle size and uniformity of the pellets; the patent publication No. CN 111620547 discloses a method of extrusion molding and granulation, which has a large particle size (0-3mm) and high density. It leads to poor fluidity of the batch material and reduces the melting efficiency of the batch material particles (because the particles are large and dense, the internal heating of the particles is slow at high temperature, the melting time is long, and the efficiency is low)

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