Ion beam sputtering film high-temperature strain gauge and preparation method thereof

An ion beam sputtering, high temperature strain gauge technology, applied in the field of sensors, can solve the problems affecting the zero drift of the strain gauge creep, sensitivity coefficient, reducing the reliability of the strain gauge, and the denaturation failure of the adhesive. Density and reliability improvement, the effect of improving the bonding force

Pending Publication Date: 2021-04-06
SHAANXI ELECTRICAL APPLIANCE RES INST
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0003] Traditional strain gauges are usually attached to the specimen with adhesives, and the adhesive layer formed by the adhesive plays a very important role in strain measurement. It must transmit the strain of the specimen to the wire grid correctly; The presence of additives not only affects the working characteristics of the strain gauge such as creep, hysteresis, zero drift, gage coefficient, and linearity, but also has the risk of reducing the reliability of the strain gauge due to adhesive denaturation and failure at high temperatures.

Method used

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  • Ion beam sputtering film high-temperature strain gauge and preparation method thereof
  • Ion beam sputtering film high-temperature strain gauge and preparation method thereof
  • Ion beam sputtering film high-temperature strain gauge and preparation method thereof

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Embodiment 1

[0044] refer to figure 1 and figure 2 , the embodiment of the present invention provides an ion beam sputtering thin film high temperature strain gauge, which can be used for measuring blade strain parameters of aeroengines; the ion beam sputtering thin film high temperature strain gauge includes a nickel-based alloy substrate 1, an insulating film layer 2, Nickel-chromium wire grid film layer 3, protective film layer 4 and electrode film 5; nickel-based alloy substrate 1, insulating film layer 2, and nickel-chromium wire grid film layer 3 are stacked sequentially from bottom to top; electrode film 5 and protective film Layer 4 is arranged on the same layer, and both are arranged on the top of nickel-chromium wire grid thin film layer 3;

[0045] The nickel-based alloy substrate 1 is used as the basis of the entire strain gauge; the thickness of the nickel-based alloy substrate 1 can be 10 μm; the insulating film layer 2 can be SiO 2 / Si 3 N 4 Composite insulating film la...

Embodiment 2

[0052] The embodiment of the present invention also provides a method for preparing the ion beam sputtered thin film high temperature strain gauge, refer to image 3 , including the following specific steps:

[0053] Step S11, making the mask plate required for the nickel-chromium wire grid film layer 3, the protective film layer 4 and the electrode film 5; before preparation, it is necessary to design and manufacture the nickel-chromium wire grid film layer 3, the protective film layer 4 and The mask pattern required for the electrode film 5, and prepare the corresponding mask plate according to the mask pattern processing;

[0054] Step S12, performing surface treatment on the nickel-based alloy substrate 1 through a polishing process, so that the surface roughness of the nickel-based alloy substrate 1 is less than 5nm; in order to meet the requirements of the deposition process, it is necessary to perform surface pretreatment on the nickel-based alloy substrate 1 before dep...

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Abstract

The invention discloses an ion beam sputtering film high-temperature strain gauge and a preparation method thereof. The ion beam sputtering film high-temperature strain gauge comprises a nickel-based alloy substrate, an insulating film layer, a nickel-chromium wire grid film layer, a protective film layer and an electrode film, wherein the nickel-based alloy substrate, the insulating film layer and the nickel-chromium wire grid film layer are sequentially stacked from bottom to top; the electrode film and the protective film layer are deposited at the top of the nickel-chromium wire grid film layer through an ion beam sputter coating process, and are arranged on the same layer; the nickel-chromium wire grid film layer is formed by etching a nickel-chromium film layer deposited on the insulating film layer through an ion beam sputter coating process; the electrode film is used for connecting a high-temperature-resistant wire. The ion beam sputtering film high-temperature strain gauge can perform stable measurement work at a high temperature.

Description

technical field [0001] The invention relates to the technical field of sensors, in particular to an ion beam sputtered film high-temperature strain gauge and a preparation method thereof. Background technique [0002] Most aero engines use turbine engines as power sources, and blades, as one of the most critical components on turbine engines, will be affected by high temperature, high pressure, and high vibration during work, and long-term work will cause engine failure. Therefore, using sensors Accurately measuring the working state of an aeroengine in a high-temperature environment has always been very important for its health monitoring technology. In addition, with the high performance of machinery and equipment in various industrial sectors, the working temperature is getting higher and higher, so the strain measurement at high temperature has become a more urgent problem in engineering. Although there are many methods for measuring high temperature stress, so far, the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01B7/16G01L1/22C23C14/46C23C14/18C23C14/58
CPCG01B7/18G01L1/22C23C14/46C23C14/18C23C14/5873
Inventor 戚云娟潘婷高波薛晓婷蔺露李莹
Owner SHAANXI ELECTRICAL APPLIANCE RES INST
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