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Photoactivated implant surface decontamination sol, and preparation method and application thereof

An implant and photoactivation technology, applied in the fields of application, chemical instruments and methods, botanical equipment and methods, etc., to achieve the effect of easy acquisition of raw materials, scientific design, and enhanced osteogenic performance

Active Publication Date: 2021-05-11
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] One of the objectives of the present invention is to provide a photoactivated implant surface decontamination sol to solve the problem in the prior art that it cannot kill residual bacteria and completely remove residual EPS without destroying the implant surface

Method used

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  • Photoactivated implant surface decontamination sol, and preparation method and application thereof
  • Photoactivated implant surface decontamination sol, and preparation method and application thereof
  • Photoactivated implant surface decontamination sol, and preparation method and application thereof

Examples

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Effect test

Embodiment 1

[0053] This embodiment discloses the preparation method of the light-activated implant surface decontamination sol of the present invention, and its preparation process is as attached figure 1 shown. Its preparation method is specifically:

[0054] Step 1. Prepare excipient sol: take an appropriate amount of sodium alginate, dissolve it in deionized water under the action of magnetic stirring, and form an excipient sol with a mass concentration of 6%, and set aside;

[0055] Step 2. Take a certain amount of oxygen-deficient titanium dioxide and disperse it in deionized water, stir it evenly with magnetic force at room temperature, and then disperse it further with ultrasound to prepare a suspension of 80 mg / mL for later use;

[0056] Step 3. Mix the suspension prepared in step 2 with the excipient sol prepared in step 1 in a volume ratio of 1:1, stir evenly at room temperature, sonicate, let stand, continue to stir, sonicate, and repeat this 3 times, Prepare working sol prec...

Embodiment 2

[0059] This embodiment discloses the preparation method of the light-activated implant surface decontamination sol of the present invention, specifically:

[0060] Step 1. Preparation of excipient sol: Take an appropriate amount of carbomer, dissolve it in deionized water under the action of magnetic stirring, adjust the pH to 5-7, and form an excipient sol with a mass concentration of 1% for later use;

[0061] Step 2. Take a certain amount of oxygen-deficient titanium dioxide and disperse it in deionized water, stir it evenly with magnetic force at room temperature, and then disperse it further with ultrasound to prepare a 100 mg / mL suspension for later use;

[0062] Step 3. Mix the suspension prepared in step 2 with the excipient sol prepared in step 1 at a volume ratio of 2:1, stir evenly at room temperature, sonicate, let stand, continue to stir, sonicate, and repeat this 3 times, Prepare working sol precursor;

[0063] Step 4. Inhale the working sol precursor prepared i...

Embodiment 3

[0065] This embodiment discloses the preparation method of the light-activated implant surface decontamination sol of the present invention, specifically:

[0066] Step 1. Prepare excipient sol: take an appropriate amount of carbomer, dissolve it in deionized water under the action of magnetic stirring, and finally form an excipient sol with a mass concentration of 6%, and set aside;

[0067] Step 2. Take a certain amount of oxygen-deficient titanium dioxide and disperse it in deionized water, stir it evenly with magnetic force at room temperature, and then disperse it further with ultrasound to prepare a 150 mg / mL suspension for later use;

[0068] Step 3. Mix the suspension prepared in step 2 with the excipient sol prepared in step 1 in a volume ratio of 3:2, stir evenly at room temperature, sonicate, let stand, continue to stir, sonicate, and repeat this 3 times, Prepare working sol precursor;

[0069] Step 4. Inhale the working sol precursor prepared in step 3 into the sc...

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Abstract

The invention discloses photoactivated implant surface decontamination sol as well as a preparation method and application thereof, solves the problem that residual bacteria cannot be killed and extracellular polymers of the residual bacteria cannot be removed on the premise that the surface of an implant is not damaged in the prior art, and belongs to the technical field of implant infection treatment. The photoactivated implant surface decontaminating sol is prepared from the following raw materials: peroxide, oxygen-deficient titanium dioxide, an excipient and water, wherein the surface decontaminating sol comprises 1-300 mg / mL of oxygen-deficient titanium dioxide; the mass concentration of peroxide in the surface decontamination sol is greater than 0.1 and less than or equal to 40%. According to the invention, the synergistic effect of photo-thermal, photocatalysis and Fenton effect of defective titanium dioxide is applied, so that the sterilizing and decontaminating effects are obviously enhanced. The decontamination sol has the advantages of mildness, broad spectrum, no damage to normal tissues and original structures or coatings on the surfaces of the implants, capability of thoroughly cleaning the implants and the like, and provides a powerful means for decontamination and cleaning of infected implants.

Description

technical field [0001] The invention belongs to the technical field of implant infection treatment, and in particular relates to a photoactivated implant surface decontamination sol, its preparation method and application. Background technique [0002] The emergence of implants has greatly promoted the development of medicine. Artificial bone joints, orthopedic titanium plates and titanium nails play a very important role in the treatment of bone-related diseases, and dental implants in the treatment of tooth loss. However, infection around the implant is often accompanied by infection, which is mostly caused by bacterial colonization. Antibiotics can be used to kill bacteria in the early stage of infection, but often due to untimely treatment, bacteria multiply and rapidly form bacterial biofilms on the surface of the implant, and the treatment at this time becomes very difficult. Since bacterial biofilm is not a simple accumulation of bacteria, but a three-dimensional ne...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D7/20C11D7/02C11D7/26C11D7/60A01N59/00C11D3/48A01P3/00A01P1/00C11D11/00
CPCC11D7/20C11D7/02C11D7/268A01N59/00C11D3/48C11D2111/14
Inventor 田卫东谢利胡兴宇
Owner SICHUAN UNIV
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