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Preparation method for controlling thickness of colloidal crystal film by adjusting humidity

A film thickness and humidity control technology, which is applied to the device for coating liquid on the surface, silicon dioxide, silicon oxide, etc., can solve the problems of different environmental humidity and lack of film materials, and achieve a large humidity range and convenient observation , thickness controllable effect

Active Publication Date: 2021-06-04
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when using the traditional vertical deposition method to repeatedly prepare silica colloidal crystal thin films, it is often impossible to obtain thin film materials with uniform thickness. We found that the above results are caused by different environmental humidity.

Method used

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  • Preparation method for controlling thickness of colloidal crystal film by adjusting humidity
  • Preparation method for controlling thickness of colloidal crystal film by adjusting humidity
  • Preparation method for controlling thickness of colloidal crystal film by adjusting humidity

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Example 1 Preparation of low-thickness silicon dioxide colloidal crystal thin film on single crystal silicon wafer

[0026] The growth device for preparing silica colloidal crystal thin films is as follows: figure 2 As shown, (1) Add 300mL pure water to the beaker, place the beaker filled with water in a closed transparent plastic box, and a hygrometer is installed in the plastic box, cover the lid, and observe the hygrometer in the plastic box after about 12 hours. The relative humidity in the plastic box reaches 99%.

[0027] (2) Use ethanol as a solvent to configure a 190nm silicon dioxide alcohol suspension with a mass concentration of 5g / L and put it into a dyeing vat, and use the monocrystalline silicon wafer soaked in piranha solution as a substrate, and insert it vertically into the container. In a staining jar with an ethanol suspension of silica.

[0028] (3) Put the dyeing vat containing the silicon dioxide ethanol suspension into the transparent plastic b...

Embodiment 2

[0030] Example 2 Preparation of high-thickness silicon dioxide colloidal crystal thin film on glass sheet

[0031] (1) Add 400g of anhydrous calcium chloride to the beaker, place the beaker in an airtight transparent plastic box, a hygrometer is housed in the plastic box, cover the lid, and observe the hygrometer in the plastic box after about 24 hours. The relative humidity reaches 5%.

[0032] (2) take ethanol as the solvent configuration mass concentration and be that the 190nm silicon dioxide alcohol suspension of 15g / L is packed in the staining vat, handle the glass slide glass as the base sheet through soaking in piranha solution, insert it vertically into the Silica alcohol suspension in the staining jar.

[0033] (3) Put the staining vat equipped with the silica alcohol suspension into the transparent plastic box in step (1), and take out the glass slide after 7 days.

[0034] Measure the thickness of the glass sheet obtained in the above step (3) by "interferometry"...

Embodiment 3

[0035] Example 3 Preparation of high-thickness silica colloidal crystal thin film on glass sheet

[0036] (1) Add 400g of anhydrous calcium chloride to the beaker, place the beaker in an airtight transparent plastic box, a hygrometer is housed in the plastic box, cover the lid, and observe the hygrometer in the plastic box after about 24 hours. The relative humidity reaches 5%.

[0037] (2) Take ethanol as the solvent configuration mass concentration and be that the 100nm silicon dioxide alcohol suspension of 15g / L is packed in the staining vat, handle the glass slide as the substrate through soaking in the piranha solution, insert it vertically into the Silica alcohol suspension in the staining jar. After measuring the length of the colloidal crystal film and dividing it by the assembly time (7 days), the assembly speed can be calculated to be about 1.8mm / day.

[0038] (3) Put the staining vat equipped with the silica alcohol suspension into the transparent plastic box in s...

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Abstract

The invention discloses a preparation method for controlling the thickness of a colloidal crystal film by adjusting humidity, which adopts a vertical deposition method and adjusts the relative humidity of a preparation environment by placing water, a saturated salt solution or a drying agent in a closed box. The preparation method comprises the following steps: vertically placing a substrate subjected to hydrophilic treatment in a prepared silica nanoparticle alcohol suspension with a certain mass concentration, placing a growth container containing the suspension and the substrate in a closed box with controlled humidity, and preparing for 2-7 days to obtain the large-area thickness-controllable silica colloidal crystal film. According to the preparation method of the silicon dioxide colloidal crystal film, the problem that the quality of films prepared in different seasons in the past is uneven is solved, the silicon dioxide colloidal crystal film which is large in area, controllable in physical thickness and stable in optical property can be repeatedly prepared without being influenced by the seasons, and the necessity of humidity control is explained in principle.

Description

technical field [0001] The invention relates to a method for preparing a colloidal crystal film controlled by adjusting humidity, and belongs to the field of self-assembly of nanomaterials. Background technique [0002] There are many methods for preparing silica colloidal crystal thin films, which can be divided into two categories according to whether there is external force involved. Compared with the preparation methods involving external force (such as spin coating method, pulling method, applied electric field deposition method, etc.), although the preparation method without external force participation takes longer, the prepared film has a better crystal structure. This leads to better optical properties. [0003] The vertical deposition method is the most common preparation method without external force participation. It is to insert the substrate sheet vertically into the ethanol or water suspension with nanoparticles, and obtain a colloidal crystal film after a pe...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C17/25C01B33/14B05D1/18
CPCC03C17/25C01B33/14B05D1/18
Inventor 钱卫平董傲
Owner SOUTHEAST UNIV
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