Method for deeply removing sodium and potassium elements in high-purity arsenic oxide

A technique for oxidizing arsenic and sodium, which is applied in chemical instruments and methods, arsenic oxide/arsenic hydroxide/oxyacid arsenic, arsenic compounds, etc. It can solve problems such as difficult stability, high impurity elements, and inability to replace imports

Inactive Publication Date: 2021-08-17
洛宁中天利新材料有限公司
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Problems solved by technology

[0004] At present, the production methods of high-purity arsenic include high-temperature oxidative distillation purification reduction sublimation method, chlorine gas chlorination rectification method, lead molten pool sublimation method and arsine hydrogen cracking method. Their common defects are high in individual impurity elements, and the product is close to 7N grade. It is difficult to stabilize above 7N level and cannot replace imported

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  • Method for deeply removing sodium and potassium elements in high-purity arsenic oxide

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Embodiment Construction

[0014] Combine below figure 1 The present invention is further described.

[0015] The processing object of this process is high-temperature oxidation of crude arsenic and multiple distillation purification to obtain high-purity arsenic oxide (mostly diarsenic trioxide and a very small amount of diarsenic pentoxide) containing 20ppb-30ppb of potassium and sodium respectively.

[0016] 1. Equipment description:

[0017] The washing mixing tank 1 is connected to the suction filter tank 3 through the discharge valve 2, under the action of the vacuum pump 9 and the vacuum control valve 10, the vacuum bag 6 forms a negative pressure, the suction filter valve 10 is opened, and the upper filter cake 20 is obtained by suction filtration. With the lower layer filtrate 21, the lower layer filtrate 21 enters the turnover lotion tank 8 through the liquid discharge valve 5 and the liquid flowing out from the discharge valve 7, opens the control valve 11, the control valve 12 and the contr...

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Abstract

The invention discloses a method for deeply removing sodium and potassium elements in high-purity arsenic oxide, and relates to the technical field of industrial purification production of non-metallic materials. The method comprises the following steps: dissolving high-temperature arsenic oxide in high-purity water, fully soaking, stirring and washing with water to dissolve sodium oxide and potassium oxide which are very easy to dissolve in water and part of arsenic oxide with low solubility in the high-purity water; and washing the filter cake with water for multiple times to obtain high-purity arsenic oxide containing potassium and sodium impurity elements less than 5ppb, thereby achieving separation of sodium oxide, potassium oxide and arsenic oxide. The process of leaching, evaporation and suction filtrating separation is adopted, the process is simple, the equipment investment is low, and the whole purification process achieves the effects of no drainage, no exhaust and no pollution.

Description

technical field [0001] The invention relates to the technical field of industrial purification production of non-metallic materials. Background technique [0002] With the rapid development of science and technology, the demand for gallium arsenide and indium arsenide is getting wider and wider, and the third-generation semiconductor material high-purity arsenic is getting more and more attention. The demand will increase and the quality will be higher and higher. , the current output of high-purity arsenic is in short supply, and the prospect is very broad. However, there is still a certain gap between my country's high-purity arsenic production technology and foreign countries, which is an important bottleneck restricting the development of high-purity arsenic in my country. Compared with foreign products of the same level, the quality of some produced high-purity arsenic is quite different, which seriously affects the development of high-purity arsenic in China. In the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01G28/00
CPCC01G28/005C01P2006/80
Inventor 李显坪陈琦李刚卢凯吴宇皓
Owner 洛宁中天利新材料有限公司
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