Copper plating additive suitable for printed circuit board and copper electroplating solution
A technology for printed circuit boards and additives, used in printed circuits, printed circuit manufacturing, electrical components, etc., can solve the problems of poor deep plating ability of electroplating solution, and achieve strong deep plating ability, reduce difficulty, and uniform distribution of ions in the coating layer. Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0055] The application discloses an electroplating copper plating solution suitable for encapsulating carrier boards and printed circuit boards. The electroplating copper plating solution consists of the following components in a concentration ratio:
[0056] Sulfuric acid 200g / L;
[0057] Copper sulfate pentahydrate 70g / L;
[0059] Copper plating additive 50ml / L;
[0060] The balance is pure water, wherein the chloride ions are derived from hydrochloric acid.
[0061] Copper plating additives consist of the following components in concentration ratio:
[0062] Brightener 30mg / L;
[0063] Leveling agent 50mg / L;
[0064] Wetting agent 20g / L;
[0065] The balance is pure water.
[0066] Wherein the brightener is sodium polydithiodipropane sulfonate, the leveling agent is polyethylene oxide polypropylene oxide monobutyl ether, and the wetting agent is polyethylene glycol 6000.
Embodiment 2
[0068] The difference from Example 1 is that the concentration ratio of the brightener in Example 2 is 1 mg / L.
Embodiment 3
[0070] The difference from Example 1 is that the concentration ratio of the brightener in Example 3 is 25mg / L.
PUM
Property | Measurement | Unit |
---|---|---|
pore size | aaaaa | aaaaa |
evenness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com