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Supramolecular assembly as well as preparation method and cleaning application thereof

A supramolecular assembly, cleaning fluid technology, applied in cleaning methods and utensils, cleaning methods using liquids, chemical instruments and methods, etc. To achieve the effect of promoting removal, solving toxicity to human body and environment, and inhibiting electrochemical corrosion

Pending Publication Date: 2021-11-05
江苏奥首材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0023] CN103602990A describes a supramolecular corrosion inhibitor for copper and alloys and its high-speed stirring preparation method. By preparing the supramolecule formed by cyclodextrin inclusion organic azole corrosion inhibitors, it solves the problem of organic azole corrosion inhibitors in water. low solubility problem
[0024] As mentioned above, cyclodextrin-based supramolecular assemblies have been intensively studied in many fields, but so far, the research on this type of supramolecular assemblies in the field of metal corrosion inhibition technology and / or semiconductor cleaning technology has not been completed. No reports and research

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  • Supramolecular assembly as well as preparation method and cleaning application thereof
  • Supramolecular assembly as well as preparation method and cleaning application thereof
  • Supramolecular assembly as well as preparation method and cleaning application thereof

Examples

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preparation example Construction

[0097] Preparation method of supramolecular assembly 1

[0098] S1: Dissolve N-isopropylhydroxylamine in water, stir until completely dissolved to obtain an aqueous solution of N-isopropylhydroxylamine; dissolve 2-hydroxypropyl-β-cyclodextrin in water, stir to fully dissolve, Then it was slowly added dropwise to the high-speed stirred N-isopropylhydroxylamine aqueous solution at 40° C., and continued to stir for 15 hours after the dropwise addition to obtain a paste;

[0099] Wherein, the mass ratio of 2-hydroxypropyl-β-cyclodextrin to N-isopropyl hydroxylamine is 3:1;

[0100] S2: After suction-filtering the paste, wash it with a sufficient amount of n-hexane, dry the obtained solid in vacuum at 40°C for 20 hours, and grind it finely after drying to obtain supramolecular assembly 1. Name it C1.

[0101] Preparation method of supramolecular assembly 2-5

[0102] The mass ratio of 2-hydroxypropyl-β-cyclodextrin to N-isopropylhydroxylamine in step S1 of the preparation method...

preparation example 1

[0109] Under stirring at room temperature, in the reactor, add the supramolecular assembly C1 of 6 mass parts, 2.75 mass parts 3-pyridyl amidoxime, 2.75 mass parts acid (be glycolic acid), 25 mass parts organic bases (be monoethanolamine ), 7.5 parts by mass of N, N-diethylhydroxylamine, 17.5 parts by mass of polyhydric alcohol (for ethylene glycol), 64 parts by mass of organic solvent (for sulfolane) and 3 parts by mass of water, then fully stirred for 40 minutes, left standstill, That is, the cleaning solution was obtained, which was named as Q1.

preparation example 2

[0111] Under stirring at room temperature, add 2 parts by mass of supramolecular assembly C2, 5 parts by mass of 3-pyridyl amidoxime, 0.5 parts by mass of acid (for hexamethylenediaminetetramethylenephosphonic acid), 40 parts by mass of Organic base (for N-ethylethanolamine), 5 parts by mass of N,N-diethylhydroxylamine, 30 parts by mass of polyhydric alcohol (for glycerol), 40 parts by mass of organic solvent (for dimethylsulfoxide) and 5 parts by mass parts by mass of water, then fully stirred for 20 minutes, and left to stand to obtain a cleaning solution, which is named as Q2.

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Abstract

The invention relates to a supramolecular assembly as well as a preparation method and application thereof, cleaning liquid containing the supramolecular assembly, application of the cleaning liquid and an etched semiconductor wafer cleaning method using the cleaning liquid. The supramolecular assembly is composed of cyclodextrin compound host molecules and reductive guest molecules; the cleaning liquid comprises the supramolecular assembly, 3-pyridyl amidoxime, acid, organic alkali, N,N-diethyl hydroxylamine, polyhydric alcohol, an organic solvent and water; and through selection and mutual cooperation of the unique cyclodextrin compound host molecules and the reductive guest molecules, the supramolecular assembly has many excellent technical effects, particularly, has an excellent residue cleaning effect and a quite low metal corrosion rate, can be used in the field of cleaning of etched semiconductor wafers, and has a good application prospect and industrial production potential.

Description

technical field [0001] The invention relates to a supramolecular assembly and its preparation method and cleaning application. The supramolecular assembly can be used in the field of cleaning semiconductor wafers after etching, and can be cleaned with low metal corrosion and excellent residue removal, belonging to semiconductor cleaning technology field. Background technique [0002] In the manufacturing process of semiconductor devices, it is necessary to use photoresist to form a mask to achieve the purpose of pattern transfer. After the photoresist is exposed and developed, the etching process is performed. During the dry etching process, the reactive ions will leave organic polymers and sputtering residues on the top and side walls of the metal, and the subsequent ashing treatment will cause new residues. Incomplete removal of residues or damage to the substrate can have a significant impact on resistivity, leakage current and yield. Therefore, in the wet cleaning proc...

Claims

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Application Information

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IPC IPC(8): C11D7/32C11D7/26C11D7/60C11D7/36C11D7/34B08B3/08
CPCC11D7/3218C11D7/268C11D7/3281C11D7/261C11D7/3245C11D7/36C11D7/265C11D7/32C11D7/34B08B3/08C11D2111/22
Inventor 侯军申海艳
Owner 江苏奥首材料科技有限公司