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Ostwald nanometer welding method

A welding film, metal nanoparticle technology, applied in welding equipment, manufacturing tools, metal processing equipment, etc., can solve the problem of slow Ostwald ripening, limited application of Ostwald ripening, and insufficient welding mechanism. Interpretation and other issues, to achieve the effect of strong adjustability, more electrochemical active sites, and controllable speed

Active Publication Date: 2021-11-12
HUNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the relevant welding mechanism has not been fully explained, and Ostwald ripening itself is a very slow process (taking dozens or even hundreds of hours), which greatly limits the Ostwald ripening process. The Application of German Ripening in Practical Welding

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] The interface self-assembly and transfer of AuNP is carried out according to the following method:

[0058] Step 1: Put 20mL of the prepared AuNP dispersion into a 50mL beaker, and then add about 5mL of cyclohexane to form a clear water-oil interface.

[0059] Step 2: Quickly inject 5 mL of ethanol to induce AuNPs to self-assemble into a dense AuNP film at the water-oil interface, then remove the cyclohexane on the upper layer of the AuNP film on the water-oil interface, and transfer the AuNP film to the corresponding substrate, Let dry naturally.

[0060] The interface self-assembly and transfer of AuNP in Example 1, and the schematic diagram of its nano-welding in the self-made nano-welding device, as well as the morphology characterization of the assembled AuNP film, please refer to figure 1 .

[0061] The AuNP thin films described in the following cases are all prepared by the method of this case unless otherwise stated.

Embodiment 2

[0063] According to the following method, direct current enhanced Ostwald nano-welding of AuNP film under different current intensities is carried out:

[0064] Step 1: Use the precision test power supply B2912A to set the corresponding parameters under the conditions of outputting each current intensity.

[0065] Step 2: Place the AuNP film transferred on the glass substrate into the welding device, and weld the AuNP film under the conditions of the current intensity of 10, 25, 40, 55, and 70mA in a pure water atmosphere 0-60min, and real-time monitoring of the resistance change of the AuNP film during the welding process.

[0066] Step 3: According to the law of resistance change with time, the AuNP film after soldering under various conditions is selectively selected for morphology characterization.

[0067] In Example 2, during the strengthened Ostwald nano-welding process under different current intensities, the relative resistance change rate of the AuNP film under diff...

Embodiment 3

[0069] AC-enhanced Ostwald nano-welding of AuNP films under different AC pulse frequencies was carried out as follows:

[0070] Step 1: Fix the current intensity to 70mA, and set different AC pulse frequencies.

[0071] Step 2: Place the AuNP film transferred on the glass substrate into a welding device, and in a pure water atmosphere, and under the condition of AC pulse frequency of 0.01, 1, 50, 500, and 5000 Hz, conduct the AuNP film Welding for 0-60min, and real-time monitoring of the resistance change of the AuNP film during the welding process.

[0072] Step 3: According to the law of resistance change with time, the AuNP film after soldering under various conditions is selectively selected for morphology characterization.

[0073] In Example 3, during the alternating current enhanced Ostwald nano-welding process under different alternating current pulse frequencies, the relative resistance change rate of the AuNP film under different current intensities varies with weld...

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Abstract

The invention belongs to the field of nanometer welding, and particularly discloses an Ostwald nanometer welding method which is used for performing surface electronic localization treatment on a metal nanoparticle film to be treated so as to strengthen Ostwald nanometer welding. According to the method, the conditions are mild and controllable, nanometer welding can be efficiently achieved, and in addition, a nanometer film obtained through welding is excellent in conductivity, electrochemical sensing performance and the like and has good application prospects.

Description

technical field [0001] The invention relates to the technical field of nano-film materials, in particular to an Ostwald nano-welding method for nano-film materials with external field strengthening, low temperature, solution-diffusion, mildness and speed controllability. Background technique [0002] Nano-welding is one of the key technologies for manufacturing single, independent nano-materials with unique size, shape, composition and lattice orientation into functional units, components and nano-devices. Based on nano-welding, good solid-state interconnections can be created between the nanomaterials themselves or between them and the external environment without damaging the morphology of the nanomaterials themselves. This can not only improve the conductivity and mechanical flexibility of nanomaterials, increase the number of electrocatalytic active sites, reduce the contact resistance of contact points, but also produce rectification characteristics in metal-semiconduct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B22F1/00B23K31/02
CPCB23K31/02Y02E60/36
Inventor 胡家文李末霞段曦东徐姚梦丽刘炳武
Owner HUNAN UNIV
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