VC radiator with built-in copper/diamond composite configuration wick and preparation method thereof
A diamond, absorbent core technology, applied in indirect heat exchangers, lighting and heating equipment, cooling/ventilation/heating renovation, etc., can solve the problems of low thermal expansion, limited thermal conductivity improvement, small diamond content, etc. Humidity, improve the overall heat transfer performance, and reduce the overall thermal resistance
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0051] Preparation of copper / diamond sintered framework:
[0052] Get the diamond particles with a particle size of 150 μm (100 mesh) to deposit a Cr transition layer, magnetron sputtering power 200w, deposition time 20min, to obtain a thickness of 2 μm diamond particles containing a Cr transition layer, and then deposit a Cr transition layer on the diamond particles containing Cr Copper plating on the surface, the specific copper plating process is: magnetron sputtering power 200w, to obtain a copper cladding layer with a thickness of 2μm, and then the diamond particles containing the copper cladding layer and the copper powder with a particle size of 150μm are in a mass ratio of 40: Mix at 60°C to obtain mixed powder, loosely pack it into a graphite mold, and sinter in a hydrogen atmosphere. During sintering, first raise the temperature to 750°C at a speed of 5°C / min, and then raise the temperature to 900°C at a speed of 3.3°C / h , the holding time is 60 minutes, and then air...
Embodiment 2
[0062] Preparation of copper / diamond sintered framework:
[0063] Get the diamond particle diameter that is 250 μm (60 order) to deposit the Cr transition layer, magnetron sputtering power 200W, deposition time 90min, obtain the diamond particle that is 9 μm in thickness and contain the Cr transition layer, and then on the diamond particle that contains the Cr overcoating layer Copper plating on the surface, the specific copper plating process is: magnetron sputtering power 200W, deposition time 90min to obtain a copper coating layer with a thickness of 9μm, and then the diamond particles containing the copper coating layer and the copper powder with a particle size of 150μm are mixed by mass Mix at a ratio of 50:50 to obtain a mixed powder, loosely pack it in a graphite mold, and sinter it under a hydrogen atmosphere. During sintering, first raise the temperature to 750°C at a rate of 300°C / h (5°C / min), and then increase the temperature at 200°C The temperature was raised to ...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com