Silicon phosphide crystal dense tube synthesis and target material production method
A silicon phosphide and target technology, applied in chemical instruments and methods, phosphides, silicon compounds, etc., can solve the problems of low carrier mobility at room temperature, easy agglomeration, easy deliquescence, etc., to improve synthesis efficiency, improve Sintering activity, the effect of increasing the density
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Embodiment 1
[0028] Embodiment 1, the method for the synthesis of silicon phosphide dense tubes and the production of the target thereof, specifically includes the following steps:
[0029] S1: Put silicon powder with a purity of 99.999% and red phosphorus with a purity of 99.999% into quartz tubes after accurate weighing. at one end of the quartz tube. The diameter of the quartz tube is 45mm, the length is 450mm, the wall thickness is 3.5mm, and the softening point is 1400°C. Before use, it should be soaked in aqua regia for 12 hours, cleaned with ultrapure water, and finally dried with infrared rays.
[0030] S2: Vacuumize the quartz tube so that the air pressure inside the quartz tube is 0.01 Torr, and seal the quartz tube with an oxyhydrogen flame. Heat the quartz tubes in the synthesis furnace respectively to 800-1200°C at the raw material end, and keep the temperature for 6-16 hours. A single-phase silicon phosphide crystal with a purity of 99.995% is synthesized.
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