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Droplet-free plasma coating arc source structure, coating system and coating method

A plasma and coating arc source technology, which is applied in the field of vacuum coating, can solve the problems of inability to meet the needs of mass production, large uniformity differences, and low deposition efficiency, and achieve the effects of increasing density, improving safety, and enhancing particle bombardment

Pending Publication Date: 2022-04-12
GUANGDONG DTECH TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to improve the ionization rate of deposited particles and solve the problem of coating droplets, some studies use magnetic field filtration structures or methods, such as S-bend magnetic filtration, L-bend, multi-stage magnetic coils, etc., to screen out uncharged particles , these methods greatly reduce or completely solve the problem of droplets reaching the workpiece, but the deposition efficiency is low, the uniformity is large, the waste of raw materials leads to high costs, and cannot meet the needs of mass production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] The preparation of AlCrN coating, its step comprises:

[0036] (1) The plasma coating arc source structure 100 is installed on the coating machine, and the AlCr target material 20 is replaced;

[0037] (2) Turn on the vacuum pump unit to evacuate to 8mPa, and heat to 500°C;

[0038] (3) Send the working gas Ar into the channel 90, so that the vacuum pressure remains at 5Pa;

[0039] (4) Turn on the first pulse power supply 50, the control switch and the set value are 500V, under the action of the electric field of the pulse bias voltage, the cavity auxiliary anode 40 generates the second plasma 47, turn on the second pulse power supply 70, and set the output The voltage is 300V, the duty cycle is 70%, prompting the second plasma 47 to move toward the workpiece 300, then adjusting the output voltage of the second pulse power supply 70 to 800V, and cleaning and etching the workpiece 300 for 30 minutes;

[0040] (5) After cleaning and etching, turn off the first pulse po...

Embodiment 2

[0045] The preparation of Ti / TiC / DLC coating, its step comprises:

[0046] (1) The plasma coating arc source structure 100 is installed on the coating machine, and the Ti target material 20 is replaced;

[0047] (2) Turn on the vacuum pump unit to evacuate to 8mPa, and heat to 250°C;

[0048] (3) Send the working gas Ar into the channel 90, so that the vacuum pressure remains at 0.5Pa;

[0049] (4) Turn on the first pulse power supply 50, the control switch and the set value are 500V, under the action of the electric field of the pulse bias voltage, the cavity auxiliary anode 40 generates the second plasma 47, turn on the second pulse power supply 70, and set the output The voltage is 300V, the duty cycle is 70%, prompting the second plasma 47 to move toward the workpiece 300, then adjusting the output voltage of the second pulse power supply 70 to 800V, and cleaning and etching the workpiece 300 for 30 minutes;

[0050] (5) After cleaning and etching, turn off the first pul...

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Abstract

The invention discloses a droplet-free plasma coating arc source structure, a coating system and a coating method.The plasma coating arc source structure comprises a target table, a target material, a cavity auxiliary anode, a first pulse power source, a direct-current arc power source and a second pulse power source, the target material is arranged on the surface of the target table, a channel is formed in the outer side of the target material, the cavity auxiliary anode is arranged in the channel, and the direct-current arc power source is arranged in the channel; the positive electrode of the first pulse power supply is electrically connected with the cavity auxiliary anode, the negative electrode of the first pulse power supply is electrically connected with the target material, the cavity auxiliary anode generates plasma under the action of the first pulse power supply, the positive electrode of the direct-current arc power supply is externally connected with an arc source anode, and the negative electrode of the direct-current arc power supply is electrically connected with the target material; the anode of the second pulse power supply is externally connected with an arc source anode, and the cathode of the second pulse power supply is externally connected with a workpiece to form a cathode. The plasma coating arc source structure has the advantages of no liquid drop, high ionization rate, good safety, and realization of large-area, uniform and stable coating production.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a droplet-free plasma coating arc source structure and coating method. Background technique [0002] Arc plasma coating technology is a kind of PVD technology, which means that during the PVD deposition process, the material to be plated forms a metal or non-metal plasma, and the plasma is deposited on the surface of the workpiece under the action of a bias electric field. Strong energy, high ionization rate, good ion diffraction, strong film adhesion, dense film, wide range of plating materials, etc., the application range is very wide, showing great economic benefits and industrial application prospects. [0003] The arc source is the source of the arc plasma discharge. Generally, a mechanical arc is used to short-circuit the arc needle and the cathode target to generate arc discharge, and arc spots are generated on the surface. The current density is as high as 10 6 -1...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/32C23C14/02
Inventor 曹时义王俊锋
Owner GUANGDONG DTECH TECH CO LTD
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