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Groove type ferroelectric storage unit structure and preparation method thereof

A technology of ferroelectric storage and unit structure, which is applied in the field of information storage, can solve the problems of the minimum area requirement of flat plate capacitors, etc., and achieve the effect of low manufacturing cost, high integration density, and increased capacitance area

Pending Publication Date: 2022-06-24
UNIV OF ELECTRONICS SCI & TECH OF CHINA
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

compared to attached image 3 The structure shown, although this structure reduces the area of ​​a single memory cell to a certain extent, it is still limited by the minimum area requirement of the plate capacitor

Method used

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  • Groove type ferroelectric storage unit structure and preparation method thereof
  • Groove type ferroelectric storage unit structure and preparation method thereof
  • Groove type ferroelectric storage unit structure and preparation method thereof

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Embodiment Construction

[0033] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the specific embodiments and the accompanying drawings. It should be understood that these descriptions are exemplary only and are not intended to limit the scope of the invention. Also, in the following description, descriptions of common structures and techniques are omitted to avoid unnecessarily obscuring the concepts of the present invention.

[0034] The preparation method of the trench type ferroelectric memory cell provided by the present invention comprises the following steps:

[0035] like Figure 5Shown is corresponding to Embodiment 1. The source region, the drain region, and the fin structure between the source and the drain of the transistor are completed by etching on the semiconductor substrate, and the preparation of the drain trench structure is completed at the same ti...

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Abstract

The invention relates to the technical field of information storage, and provides a groove type ferroelectric storage unit structure and a preparation method thereof. According to the invention, a fin type field effect transistor FinFET is adopted to replace a traditional planar transistor in a preparation process, and compared with the traditional planar transistor, the FinFET transistor has absolute advantages in the aspects of inhibiting a short channel effect and reducing electric leakage. The method further comprises the step of folding and integrating the ferroelectric capacitor on the surface and the side wall of the groove formed in the drain electrode region. Compared with a traditional structure, the ferroelectric memory cell structure provided by the invention can further reduce the size of the memory cell. And under the same process node, the data information capacity can be greatly improved only by changing the structure of the memory device. The ferroelectric memory chip is simple in structure and can be widely applied to high-density ferroelectric memory chips.

Description

technical field [0001] The invention relates to the field of information storage, in particular to a ferroelectric storage unit structure and a preparation method. Background technique [0002] Ferroelectric memory is a new type of non-volatile memory. Compared with traditional memory, ferroelectric memory has the following advantages: fast access time, low operating voltage, low read and write power consumption, and long service life. Moreover, the ferroelectric memory, as a RAM-type memory, still exists after the power is turned off and will not be lost. In addition, the strong radiation resistance of ferroelectric memory makes it unique in aerospace applications. [0003] In some dielectric crystals, the special structure of the unit cell makes the positive and negative charge centers do not coincide and an electric dipole moment occurs, resulting in an electric polarization intensity not equal to zero, so that the crystal has spontaneous polarization, and the direction...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/11507H01L29/78H01L23/64H10B53/30
CPCH01L28/90H01L29/785H10B53/30
Inventor 李建军邓皓王刚李威
Owner UNIV OF ELECTRONICS SCI & TECH OF CHINA
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