Groove type ferroelectric storage unit structure and preparation method thereof
A technology of ferroelectric storage and unit structure, which is applied in the field of information storage, can solve the problems of the minimum area requirement of flat plate capacitors, etc., and achieve the effect of low manufacturing cost, high integration density, and increased capacitance area
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[0033] In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the specific embodiments and the accompanying drawings. It should be understood that these descriptions are exemplary only and are not intended to limit the scope of the invention. Also, in the following description, descriptions of common structures and techniques are omitted to avoid unnecessarily obscuring the concepts of the present invention.
[0034] The preparation method of the trench type ferroelectric memory cell provided by the present invention comprises the following steps:
[0035] like Figure 5Shown is corresponding to Embodiment 1. The source region, the drain region, and the fin structure between the source and the drain of the transistor are completed by etching on the semiconductor substrate, and the preparation of the drain trench structure is completed at the same ti...
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