Composite wafer protective film and preparation method thereof

A technology of composite crystal and protective film, applied in the direction of pressure-sensitive film/sheet, film/sheet-like adhesives, adhesives, etc. Protective film adhesion and other issues, to reduce redundant processes, not easy to heat shrink, and improve production efficiency

Pending Publication Date: 2022-07-22
广东莱尔新材料科技股份有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the use of PVC base film will inevitably lead to the problem of plasticizer migration. In the long run, it will affect the adhesion of the adhesive layer of the protective film to the substrate, resulting in peeling residue, and the plasticizer will migrate through the adhesive layer to the protected area. of the wafer surface causing wafer contamination
In addition, the adhesive needs heat curing after coating, and PVC itself has poor thermal stability and is easy to shrink when heated, so the adhesive is generally transferred to PVC by transfer coating, but the production process of transfer coating is complicated and cumbersome, which leads to Wafer protection film production efficiency is very low

Method used

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  • Composite wafer protective film and preparation method thereof

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preparation example Construction

[0056] A preparation method of a composite wafer protective film, used for preparing the above-mentioned composite wafer protective film, comprises the following steps:

[0057] A. The polyvinyl chloride film is used as the polyvinyl chloride layer 2, and a UV release agent is coated on any side of the polyvinyl chloride layer 2, and a release layer 1 is formed after UV irradiation and curing, and a release layer 1 and polyvinyl chloride are obtained. the first composite layer of vinyl layer 2;

[0058] B, the raw material of thermoplastic polyurethane elastomer layer 3 is extruded and compounded by means of co-extrusion casting to obtain thermoplastic polyurethane elastomer layer 3;

[0059] C, prepare the pressure-sensitive adhesive solution, coat the pressure-sensitive adhesive solution on the surface of the thermoplastic polyurethane elastomer layer 3 of step B, and obtain the second composite layer with the thermoplastic polyurethane elastomer layer 3 and the pressure-sen...

Embodiment 1

[0077] Embodiment 1-a kind of preparation method of composite wafer protective film

[0078] A. Use a polyvinyl chloride film with a thickness of 20 μm, a tensile strength of 20 MPa and an elongation at break of 250% as the polyvinyl chloride layer, apply UV release agent on any side of the polyvinyl chloride layer, and use a high-pressure mercury lamp. After the UV release agent is cured by UV irradiation, a release layer with a thickness of 0.5 μm and a release force of 4gf / 25mm is formed to obtain a first composite layer with a release layer and a polyvinyl chloride layer; wherein, the strength of the curing step is is 100W / cm, and the energy density is 400mJ / cm 2 ;

[0079] B. The polyester thermoplastic polyurethane elastomer is extruded and compounded by co-extrusion casting to obtain a thermoplastic polyurethane elastomer layer with a thickness of 5 μm, a tensile strength of 20 MPa and an elongation at break of 250%;

[0080] C, prepare the pressure-sensitive adhesive...

Embodiment 2

[0082] Embodiment 2-a kind of preparation method of composite wafer protective film

[0083] A. A polyvinyl chloride film with a thickness of 100 μm, a tensile strength of 25 MPa and an elongation at break of 280% is used as the polyvinyl chloride layer, and UV release agent is coated on any side of the polyvinyl chloride layer, and a high-pressure mercury lamp is used. After the UV release agent is cured by UV irradiation, a release layer with a thickness of 1.5 μm and a release force of 3gf / 25mm is formed to obtain a first composite layer with a release layer and a polyvinyl chloride layer; wherein, the strength of the curing step is is 140W / cm, and the energy density is 700mJ / cm 2 ;

[0084] B. The polyether thermoplastic polyurethane elastomer is extruded and compounded by co-extrusion casting to obtain a thermoplastic polyurethane elastomer layer with a thickness of 25 μm, a tensile strength of 25 MPa and an elongation at break of 280%;

[0085] C, prepare a pressure-se...

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Abstract

The invention discloses a composite wafer protective film and a preparation method thereof. The composite wafer protective film comprises a release layer, a polyvinyl chloride layer, a thermoplastic polyurethane elastomer layer and a pressure-sensitive adhesive layer which are sequentially stacked from bottom to top, and the thickness of the thermoplastic polyurethane elastomer layer is 5-50 [mu] m. According to the composite wafer protection film provided by the technical scheme, the thermoplastic polyurethane elastomer layer is introduced into the polyvinyl chloride layer and the pressure-sensitive adhesive layer and can be used as a barrier layer to prevent a plasticizer in polyvinyl chloride from being migrated to the pressure-sensitive adhesive layer, so that the flexibility and ductility of the wafer protection film are ensured, and the service life of the wafer protection film is prolonged. The adhesive force of the pressure-sensitive adhesive layer to the base layer can be effectively improved. The preparation method of the composite wafer protection film is low in process dependence, high in flexibility and beneficial to improving the production efficiency of the composite wafer protection film.

Description

technical field [0001] The invention relates to the technical field of wafer protection, in particular to a composite wafer protection film and a preparation method thereof. Background technique [0002] Semiconductor is one of the indispensable raw materials for the production of all electronic products. The performance of electronic products is completely dependent on the quality of semiconductor products, and the manufacture of wafers is the most important part of the semiconductor industry. In the process of manufacturing a semiconductor chip from a wafer, multiple processes such as grinding, cleaning, and cutting are required. In order to prevent the wafer from being damaged during the processing process, the wafer needs to be protected under the above-mentioned processes. [0003] Wafer process protective film is a protective film specially used in the semiconductor industry, which plays the role of wafer high solder ball protection, ultra-thin wafer grinding protectio...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09J7/29C09J7/38
CPCC09J7/29C09J7/38C09J2301/122C09J2301/16C09J2301/302C09J2427/006C09J2475/006
Inventor 李政张强
Owner 广东莱尔新材料科技股份有限公司
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