Method for on-line producing low radiation film glass by floating process

A technology of low-emissivity film and float glass, which is applied in the field of on-line production of low-emissivity film glass by float method, which can solve the problems of complex process and difficult control.

Inactive Publication Date: 2005-06-01
HANGZHOU BLUSR NEW MATERIALS TECH
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  • Abstract
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Problems solved by technology

The reaction substances involved in this method require instantaneous decomposition reaction at high temperature, which is not easy to control, and the process is complex

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0028] In the tin tank of the float glass production line, a reactor is set above the glass ribbon; it is used to direct the precursor gas mixture of silane, borane, ethylene, and carbon dioxide to flow along the surface of the glass to be coated; the surface of the glass ribbon The temperature is 645°C; the pulling speed of the glass ribbon is 430 m / h; the concentration of silane is 10%, the concentration of borane is 10%; the concentration of ethylene is 99%; the concentration of carbon dioxide is 20%; the volume ratio of the mixed gas is borane: silane: ethylene : carbon dioxide = 0.002: 1: 8: 4, using nitrogen as a diluent gas; deposition to obtain a shielding layer. The measured refractive index of the film is 1.7, the visible light transmittance is 82.5%, and the film thickness is 60nm.

[0029] The glass ribbon coated with the shielding layer is advanced to the front of the annealing furnace; a reactor with a single-channel steam inlet structure is set above it; trifluo...

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Abstract

The invention relates to a method for online production of low-emissivity film glass by float method. The method utilizes chemical vapor deposition method to deposit silicon oxide, boron oxide doped with carbon shielding layer and tin oxide, antimony oxide doped with fluorine and phosphorus on the hot glass surface. Composite film layer for low emissivity layer. Compared with the existing technology, the film layer prepared by this method has higher deposition rate at the same temperature, uniform film layer, small surface resistance, high conductivity, low emissivity, good wear resistance, strong alkali resistance, and has It has the advantages of stable production, high production efficiency, and is suitable for manufacturing large-scale low-e glass.

Description

technical field [0001] The invention relates to a method for on-line production of low-emissivity film glass by float method. Specifically, chemical vapor deposition is used to deposit a composite film layer of silicon oxide, boron oxide doped with carbon shielding layer and tin oxide, antimony oxide doped with fluorine, and phosphorus low-radiation layer on the hot glass surface. Background technique [0002] People are accustomed to coating low-emissivity films on glass, such as tin oxide films, to change the radiation and reflection characteristics of glass to mid- and far-infrared rays. However, if low-emissivity films are directly coated on the glass surface, since the alkali metal ions inside the glass are easy to migrate to the glass surface, It will deteriorate the electrothermal performance of the film layer, increase the surface resistance and reduce the physical and chemical stability, and cause the low-emissivity layer to produce whit...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03B18/12C03C17/245C03C17/34
Inventor 汪建勋韩高荣刘起英刘军波陈华翁文剑杜丕一孔繁华曹涯雁赵年伟赵明应益明王伟
Owner HANGZHOU BLUSR NEW MATERIALS TECH
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