Method for mfg. optical elements
A technology for optical components and manufacturing methods, applied in optical components, optics, nonlinear optics, etc., can solve problems such as insufficient luminous brightness level, inconsistent ink volume in pixel areas, and uneven brightness distribution.
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example 1
[0108] After the substrate 1 is in contact with water in this process, if the substrate is heated and dried above 100[deg.], the effect of ink spreading can be reduced. Therefore, it is preferable to perform heat treatment at a temperature lower than 100°. Example 1 (formation of black matrix)
[0109]A black photoresist (V-259BK resist, available from Shinnittetsu Kagaku) containing carbon black was applied to a glass substrate (#1737, available from Corning), and subjected to predetermined exposure treatments, development and flash drying , to prepare a black matrix pattern (partition wall) having a film thickness of 2 μm, and a rectangular opening with a size of 75 μm×225 μm. (preparation ink)
[0110] R, G and B inks having the following mixtures were prepared using an acrylic copolymer thermosetting component comprising the volume ratios shown below.
[0111] Thermohardening composition:
[0112] 50 parts by weight of methyl methacrylate
[0113] 30 parts by weight...
example 2
[0151] A color filter sample was manufactured as in Example 1 except that "CK-S171X resist" (available from Fujifilm Corporation) was used as a black matrix containing carbon black. After the plasma treatment step, the black matrix exhibits the following contact angles with respect to pure water.
[0152] Glass substrate surface: 5°
[0153] Black matrix substrate surface 128°
[0154] The surface average roughness (Ra) of the black matrix was 10.3 nm. The color filter swatch for this example does not show any color mixing, and there are no blank areas, with the colored parts appearing as flat surfaces. Example 3
example 3
[0155] Color filter samples were fabricated as in Example 1 except that argon gas was introduced during the dry etching process. After the plasma treatment step, the black matrix exhibits the following contact angles relative to pure water:
[0156] Glass substrate surface: 8°
[0157] Black matrix substrate surface 132°
[0158] The surface average roughness (Ra) of the black matrix was 6.8 nm. The color filter sample for this example does not show any color mixing and has no blank areas, the colored parts appear as flat surfaces. Example 4
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