Method for preparing fluorinion doped lead tungstate scintillation crystal
A technology of scintillation crystal and lead tungstate, which is applied to the preparation of fluoride ion-doped lead tungstate scintillation crystal. Gas phase transport diffusion doped fluoride ion into the field of pure PWO4 crystal, which can solve the problem of volatilization, uneven distribution, and emission wavelength. , the light output is not the same along the growth direction, etc., to achieve high light output, improve distribution uniformity, and improve the effect of uniformity
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Embodiment 1
[0023] Embodiment 1: Prepare 20×20×2mm 3 PWO crystals doped with 100ppm (wt%) F ions
[0024] The process steps of preparation are as follows:
[0025] In the platinum crucible 1, PWO and PbF with pores 2 are placed 2 Mixture block 3, select [PWO] / [PbF 2 ]=98:2 weight ratio;
[0026] 20×20×2mm grown by pulling method or descending method 3 wafers, placed or suspended on platinum wires, plus covered with PWO and PbF 2 The crucible cover of mixing powder 7 and thermocouple 8, the top of the crucible is sealed with a platinum cover 9, and placed in a resistance furnace;
[0027] Heating up to about 500°C, keeping the temperature constant for 20 hours, F ions diffuse into the PWO wafer, and then cooling down to room temperature at a cooling rate of 50°C / h, finally obtaining 100ppm fluorine ion-doped PWO scintillation crystal.
[0028] The light output of the scintillation crystal is about 15% higher than that of the pure PWO crystal, and the crystal can be applied in the ...
Embodiment 2
[0029] Embodiment 2: Prepare 50×50×20mm 3 Doped 200ppm (wt%) F ion PWO crystal
[0030] The process steps of preparation are as follows:
[0031] In the platinum crucible 1, PWO and PbF with pores 2 are placed 2 Mixture block 3, select [PWO] / [PbF 2 ]=60:40 weight ratio;
[0032] 50×50×20mm grown by pulling method or descending method 3 wafers, placed or suspended on platinum wires, plus covered with PWO and PbF 2 The crucible cover of mixing powder 7 and thermocouple 8, the top of the crucible is sealed with a platinum cover 9, and placed in a resistance furnace;
[0033] Heating up to about 700°C, keeping the temperature constant for 60 hours, F ions diffuse into the PWO wafer, and then cooling down to room temperature at a cooling rate of 50°C / h, finally obtaining 200ppm fluorine ion-doped PWO scintillation crystals.
[0034] The light output of the scintillation crystal is about 3 times higher than that of the pure PWO crystal, and the crystal can be applied to high-...
Embodiment 3
[0035] Embodiment 3: Prepare 80×80×50mm 3 Doped 350ppm (wt%) F ion PWO crystal
[0036] The process steps of preparation are as follows:
[0037] In the platinum crucible 1, PWO and PbF with pores 2 are placed 2 Mixture block 3, select [PWO] / [PbF 2 ]=0:100 weight ratio;
[0038] 80×80×50mm grown by pulling method or descending method 3 wafers, placed or suspended on platinum wires, plus covered with PWO and PbF 2 The crucible cover of mixing powder 7 and thermocouple 8, the top of the crucible is sealed with a platinum cover 9, and placed in a resistance furnace;
[0039] Heating up to about 800°C, constant temperature for 400 hours, F ions diffused into the PWO wafer, and then cooling down to room temperature at a cooling rate of 50°C / h, finally obtaining 350ppm fluorine ion-doped PWO scintillation crystal.
[0040] The light output of the scintillation crystal is about 5 times higher than that of the pure PWO crystal, and the crystal can be applied to high-energy ph...
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