ITo coated plate and its preparing method

A substrate and alloy film technology, applied in chemical instruments and methods, glass/slag layered products, layered products, etc., can solve the problems of not meeting the requirements of ITO substrate surface flatness, increasing process difficulty, and low yield , to achieve high visible light transmittance, excellent realization effect, and low square resistance effect

Inactive Publication Date: 2005-12-21
深圳豪威显示科技有限公司
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, the method of increasing the temperature of the substrate and increasing the thickness of the film is generally used to prepare low-resistivity ITO films. However, the grains of thick ITO films deposited at high temperatures will grow or form columnar structures, which will make the surface rough and cannot meet the requirements of organic electroluminescence. Device (OLED) and other flat-panel displays require ITO substrate surface flatness
[0004] Usually, in order to obtain a relatively smooth and low square resistance ITO film, mechanical polishing, acid-base chemical treatment, plasma treatment and other methods are used for post-processing, but this increases the difficulty of the process and the yield is very low

Method used

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  • ITo coated plate and its preparing method

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Effect test

Embodiment 1

[0020] Embodiment 1. An ITO coated board includes a glass substrate 1 , a first layer of ITO film 2 , a silver-gold alloy film 3 and a second layer of ITO film 4 . The first layer of ITO film 2 is deposited on the surface of the substrate, the silver-gold alloy film is deposited on the first layer of ITO film, and the second layer of ITO film is deposited on the silver-gold alloy film. The weight ratio of silver and gold in the silver-gold alloy film is 97:3. The thickness of the first and second layers of ITO film is 45nm, and the thickness of the silver-gold alloy film is 15nm.

[0021] The square resistance of the above-mentioned ITO coated plate is less than 15Ω / □, the transmittance of visible light is 80%, and it can be used as an excellent flat panel display substrate.

Embodiment 2

[0022] Embodiment two, the preparation method of a kind of ITO coating plate, is to adopt the dc magnetron sputtering process to deposit the first layer of ITO film on the substrate, then deposit the alloy film on the first layer of ITO film, then deposit the second layer on the alloy film Two layers of ITO film. The DC magnetron sputtering process is used in the coating process. In this process, the working gas is fed into the background vacuum environment, and the power source is used to generate plasma to bombard the target material, so as to obtain a deposited film on the substrate. Its power supply is composed of a pulse power supply in series with a DC power supply, the pulse frequency is 20-100kHz, and the background vacuum should be better than 1×10 -3 Pa.

[0023] When depositing the ITO film, indium tin oxide ceramics are used as the target, where In 2 o 3 with SnO 2 The weight ratio is 90:10; argon-oxygen mixed gas is used as the working gas, wherein oxygen acco...

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Abstract

The invention discloses s one kind of ITO board with film-plate, it not only includes base board and the first deposited ITO film on it, also includes alloy film and the secondary ITO film, the alloy film is on the primacy film, and the secondary ITO film is on the surface of alloy film. This invention also unfurls the preparation method of this kind of ITO board with film-plate. The beneficial effect of this invention is that if this ITO/alloy/ ITO layers is used, we can get low electric resistance using the electrical conductivity. Because the ITO film include two films when it deposit, it can avoid the growth of the crystal or pole fabric, and pledge to receive low degree of roughness.

Description

【Technical field】 [0001] The invention relates to a vacuum coating technology, in particular to an ITO coating plate and a preparation method thereof. 【Background technique】 [0002] ITO (Indium Tin Oxide) film has excellent electrical conductivity and visible light transmittance, is an important transparent conductive film, and has been widely used in optoelectronic devices. There are many ways to prepare ITO film. At present, the DC magnetron sputtering method is generally used, and the radio frequency sputtering method can also be used, but the latter has strict requirements on equipment and high cost. [0003] The performance of ITO film has made it widely used in flat panel display devices, and the ITO coating film with low sheet resistance and high light transmittance has been pursued by the industry. At present, the method of increasing the temperature of the substrate and increasing the thickness of the film is generally used to prepare low-resistivity ITO films. H...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B17/00
Inventor 许生柴卫平许沭华戚祖强范垂祯高文波梁锐生
Owner 深圳豪威显示科技有限公司
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