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Vinyl polymer and light sensitivity lithographic plate containing said polymer

A technology of vinyl polymers and printing plates, applied in the field of photosensitive lithographic printing plates, can solve the problems of low film retention rate of alkali resistance of plates, influence of printing durability of plates, poor adhesion of plate bases, etc., and achieve High anti-alkali film retention rate, tough coating and strong adhesion

Active Publication Date: 2006-03-29
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the thermoplastic phenolic resin used as a film-forming resin has the following defects: poor adhesion to the plate base, poor coatability, brittle surface film, poor wear resistance, poor printing resistance when used as a lithographic plate Low
However, the alkali-resistant film retention rate of the plate is low, which affects the printing durability of the plate

Method used

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  • Vinyl polymer and light sensitivity lithographic plate containing said polymer
  • Vinyl polymer and light sensitivity lithographic plate containing said polymer
  • Vinyl polymer and light sensitivity lithographic plate containing said polymer

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0060] In a 250ml three-necked flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 0.18g of benzoyl peroxide. Use a hot water bath to heat to 75°C while passing nitrogen protection. 20gN, N-dimethylformamide, 7.8gN-(4-hydroxybenzene) methacrylamide, 4.5gN-(4-sulfonamidobenzene) maleimide, 3.2g butyl methacrylate were added dropwise The mixed solution composed of esters was added dropwise in 2 hours. React at constant temperature for 10 hours. After the reaction was completed, 40 g of methanol was added, cooled, added into 2 L of water with stirring, stirred for 1 hour, filtered and dried to obtain 12.98 g of white solid. The weight-average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 45,000.

[0061] Dissolve 10 grams of the polymer obtained above in 200 grams of N,N-dimethylformamide, add 0.1 grams of triethylamine while stirring, raise...

Synthetic example 2

[0063] In a 500ml four-necked flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 1.8g of benzoyl peroxide. Use a hot water bath to heat to 75°C while passing nitrogen protection. Add dropwise 130g N, N-dimethylformamide, 1g N-(4-hydroxybenzene) methacrylamide, 1gN-(4-sulfonamidobenzene) maleimide, 70g N-(4-acetoxy The mixed solution that phenyl)maleimide, 28g methyl methacrylate forms, adds dropwise in 2 hours. React at constant temperature for 10 hours. After the reaction was completed, 200 g of methanol was added, cooled, added to 2 L of water with stirring, and filtered and dried after stirring for 1 hour to obtain 90.98 g of a white solid. The weight average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 54,000.

Synthetic example 3

[0065] In a 500ml four-necked flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 1.8g of benzoyl peroxide. Use a hot water bath to heat to 75°C while passing nitrogen protection. Add dropwise 130g N, N-dimethylformamide, 70g N-(4-hydroxyphenyl)methacrylamide, 20gN-(4-sulfonamidobenzene)maleimide, 1g N-(4-acetoxy The mixed solution that phenyl)maleimide, 9g methyl methacrylate forms, drops in 2 hours. React at constant temperature for 10 hours. After the reaction was completed, 200 g of methanol was added, cooled, added into 2 L of water with stirring, and filtered and dried after stirring for 1 hour to obtain 90.00 g of a white solid. The weight average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 64,000.

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Abstract

A vinyl polymer has alkali-soluble structure unit, alkali-soluble maleimide structure unit and acid phase-changing carboxylate structure unit. A photosensitive male planographic plate containing said high-molecular polymer features high developing tolerance, high resistance of photosensitive layer to wearing and chemical, and high printing durability.

Description

technical field [0001] The present invention relates to a polymer and a photosensitive lithographic printing plate containing the polymer in a photosensitive layer, and more particularly, to a vinyl polymer and a photosensitive compound having a positive working type and abrasion resistance, A photosensitive lithographic printing plate with a photosensitive layer made of a high-molecular compound with excellent chemical resistance, a high film retention rate, a wide development range, and no contamination during printing. Background technique [0002] The photosensitive composition formed of O-naphthoquinone diazide compound and phenolic resin, as a very excellent photosensitive composition, has been applied to lithographic printing plates and photoresist films in industry. However, the thermoplastic phenolic resin used as a film-forming resin has the following defects: poor adhesion to the plate base, poor coatability, brittle surface film, poor wear resistance, poor printi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08F20/10G03F7/004G03F7/022
Inventor 姚新鼎门红伟刘伟柴廷会高英新李剑波
Owner LUCKY HUAGUANG GRAPHICS
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