Production method for semiconductor wafer
A manufacturing method and semiconductor technology, applied in semiconductor/solid-state device manufacturing, manufacturing tools, and machine tools suitable for grinding workpiece planes, etc., can solve the problems of slow cutting speed and inability to obtain wafer flatness, etc., to maintain wafer flatness , Omit the polishing process and reverse surface grinding process, the effect of small grinding damage
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[0032] A slurry of GC#800 abrasive particles at a concentration of 0.3 wt% was supplied to a double-sided polisher with a porous closed-cell polyurethane pad ( image 3 ), and perform semi-fixed abrasive grinding. As a result, in a 300 mm wafer, a semiconductor wafer with a semi-specular surface, cutting rate = 2 to 5 μm / min, flatness TTV < 1.0 μm, and surface roughness Ra < 400 angstroms was obtained.
[0033] In addition, this process method (semi-fixed abrasive grinding) can be suitably combined with the manufacturing process steps shown in FIGS. 1 and 2 to manufacture semiconductor wafers. shown in Table 1 compared to Figure 7The conventional manufacturing process reduces the thickness of the removed part and results in microscopic surface relief (nanotopography).
[0034] As can be clearly seen from Table 1, compared to the conventional process ( Figure 7 ) in 10mm 2 Dimensions in the nanotopography value of 24.9nm, in figure 1 The fabrication process shown is 24....
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