An organic light-emitting display device electrode substrate

A technology for light-emitting display devices and electrode substrates, which is applied to electric solid-state devices, semiconductor devices, semiconductor/solid-state device components, etc., can solve the problems of difficult etching process, prolonged substrate etching cycle, etc., and achieves improved display efficiency, reduced resistance, Deterioration prevention effect

Inactive Publication Date: 2007-05-30
KUNSHAN VISIONOX DISPLAY TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Titanium dioxide film has good thermal stability in the air, so that the stability of the substrate during storage and processing has been significantly improve

Method used

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  • An organic light-emitting display device electrode substrate

Examples

Experimental program
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Example Embodiment

[0020] Example 1

[0021] Refer to Figures 1 and 2. The electrode substrate of the organic light emitting display device of this embodiment includes ITO (150nm) serving as the electrode layer 1 and silver metal (160nm) serving as the wire layer 2, on which a sputtering method is used to prepare a vanadium metal protective layer 3 with a thickness of 15nm.

[0022] The metallic silver wire layer 2 and the metallic vanadium protective layer 3 are simultaneously etched using an etching solution with a volume ratio of phosphoric acid:nitric acid:water=9:1:3, and the etching rate is 40A / s. The underlying ITO is etched with an etching solution with a volume ratio of nitric acid: hydrochloric acid: water=1:10:10, and the etching rate is 10A / s. Through the above conditions, the structure shown in Figure 2 can be prepared. The surface resistance of the wire layer 2 is 0.1 ohm / sq. When heated at 120° C. for 30 minutes, the surface resistance is 0.11 ohm / sq, showing good stable performance. ...

Example Embodiment

[0023] Example 2

[0024] Refer to Figures 1 and 2. The electrode substrate of the organic light emitting display device of this embodiment includes ITO (150 nm) serving as the electrode layer 1 and aluminum metal (300 nm) serving as the wire layer 2. A dual-source vapor deposition method is adopted on it, and a mixture of metal indium and metal palladium is vapor-deposited as the protective layer 3. The vapor deposition quality ratio of metal indium and metal palladium is controlled to be a metal mixed layer of 9.5:1, that is, the protective layer 3 The thickness is 15nm.

[0025] The wire layer 2 of metal aluminum and the protective layer 3 of the mixture of metal indium and metal palladium are simultaneously etched using an etching solution with a volume ratio of phosphoric acid:nitric acid:water=8:1:3, and the etching rate is 30A / s. The underlying ITO is etched with an etching solution with a volume ratio of nitric acid: hydrochloric acid: water=1:10:10, and the etching rate i...

Example Embodiment

[0026] Example 3

[0027] Refer to Figures 1 and 2. The electrode substrate of the organic light emitting display device of this embodiment includes ITO (150 nm) serving as the electrode layer 1 and a copper-silver alloy (300 nm) serving as the wire layer 2. The composition of the copper-silver alloy is copper:silver=1:9. A sputtering method is used on it, and zinc oxide is sputtered as the protective layer 3, and the thickness of the protective layer 3 is 12 nm.

[0028] The copper-silver alloy wire layer 2 and the zinc oxide protective layer 3 are simultaneously etched using an etching solution with a volume ratio of phosphoric acid:nitric acid:water=9:2:3, and the etching rate is 60A / s. The underlying ITO is etched with an etching solution with a volume ratio of nitric acid: hydrochloric acid: water=1:10:10, and the etching rate is 10A / s. Through the above conditions, the structure shown in Figure 2 can be prepared. The surface resistance of the wire layer 2 is 0.25 ohm / sq. Whe...

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Abstract

This invention discloses one organic light display electrode baseboard, which orderly comprises electrode layer, wire layer and protection layer composed of vanadium indium and zinc or nickel, wherein, the wire layer adopts silver, copper or aluminum metal or alloy and mixture with low electrode resistance to improve display effect; the materials is easily damaged by the oxidation or fulguration element and so this invention sets one protection layer composed of vanadium, indium or zinc or nickel element on the wire layer.

Description

technical field [0001] The invention relates to an electrode substrate, in particular to an electrode substrate of an organic light-emitting display device. Background technique [0002] Organic electroluminescent displays (OLEDs) have a series of advantages such as self-luminescence, low-voltage DC drive, full curing, wide viewing angle, and rich colors, and have broad application prospects. Among them, the electrode substrate used in the OLED display is one of the key structures that determine the performance of the device, and is usually composed of a glass substrate and an electrode layer structure attached thereto. [0003] In order to further reduce the voltage drop of the wire, metal wire layers with lower resistivity are mostly used. Metals such as chromium, copper, molybdenum, aluminum, silver, etc. are used. Among them, copper, aluminum, silver and other metals have lower resistivity, so that the product has a lower driving voltage, thereby reducing the overall p...

Claims

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Application Information

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IPC IPC(8): H01L27/32H01L23/532
Inventor 邱勇刘嵩高裕弟陈珉
Owner KUNSHAN VISIONOX DISPLAY TECH
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