Unlock instant, AI-driven research and patent intelligence for your innovation.

Pellicle membrane

a technology of pellicle membrane and pellicle, which is applied in the field of pellicle membrane, can solve the problems of cumbersome and complicated manufacturing process of pellicle membrane, and achieve the effect of simple manufacturing and long-term maintenance of patterning precision

Active Publication Date: 2014-08-26
MITSUI CHEM INC
View PDF17 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides a pellicle membrane that is resistant to photodeterioration or photodecomposition when exposed to light. Therefore, even when using short-wavelength exposure light for lithography, patterning accuracy can be maintained for a long period of time. Additionally, the manufacturing process of the pellicle membrane does not require any special treatment steps.

Problems solved by technology

Approaches have been proposed to limit photodeterioration or photodecomposition, e.g., forming a fluorinated layer on the membrane's surface or fluorinating polymer's terminal groups; however, these methods require a special treatment that uses fluorine gas, which not only makes the manufacturing process of pellicle membranes cumbersome and complicated, but may allow foreign particles to adhere to the pellicle membrane during the fluorine gas treatment.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Pellicle membrane
  • Pellicle membrane
  • Pellicle membrane

Examples

Experimental program
Comparison scheme
Effect test

examples

[0067]The present invention will now be described in more detail with reference to Examples, which however shall not be construed as limiting the scope of the present invention.

examples 1to 7

,Comparative Examples 1to 4

[0068]An amorphous fluoropolymer CYTOP (code: CHX809SP2, Asahi Glass, Co., Ltd.) was dissolved into a fluorine-containing solvent perfluorotributylamine (EFL-174S, Tohkem Products, Corporation) to afford a solution containing 6wt % polymer. The solution thus obtained was filtrated through a polytetrafluoroethylene (PTFE) membrane filter (pore size: 500nm) to afford a filtrate deprived of foreign material.

[0069]The filtrate thus obtained was applied onto a surface of a quarts glass substrate (25cm×25cm) by spin coating (spin speed: 700 rpm, spin time: 60seconds) to deposit a coated film.

[0070]The coated film formed on the substrate surface was heated to 165° C. in a clean oven. The heating time was adjusted as shown in Table 1below (in the range of 80to 400seconds) to produce a dried film. After drying, a resin-made peeling ring was attached to the dried film on the substrate surface, and the dried film was peeled off the substrate to provide a pellicle mem...

examples 8to 11

, Comparative Example 7

[0091]Pellicle membranes were prepared in the same manner as in Example 1except that the spin coating condition was changed and that the drying temperatures and drying times given in Table 2were used. The pellicle membranes obtained had a thickness of 281nm. In the same manner as in Example 1, the fluorine-containing solvent contained in the pellicle membrane was gasified, and the amount of the gasified fluorine-containing solvent was measured. The fluorine-containing solvent contents are given in Table 2.

[0092]

TABLE 2Drying temp.Drying timeFluorine-based solvent content(° C.)(sec)(ppm by weight)Comp. Ex. 7165380 3Ex. 8165350 7Ex. 916532013Ex. 1016529016Ex. 1116526027

[0093]Each of the pellicle membranes prepared in Example 11and Comparative Example 7was irradiated with ArF excimer laser in the same manner as in Example 1. The irradiation density was set to 1 mJ / cm2 / pulse, and laser oscillation frequency to 500Hz.

[0094]The graph shown in FIG. 4 is a graph of re...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
wavelengthaaaaaaaaaa
wavelengthaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The purpose of the present invention is to produce a pellicle film, which is suppressed in light deterioration or photodecomposition due to lithography light exposure, by simpler processes. Specifically disclosed is a pellicle film for lithography containing an amorphous fluoropolymer, which is characterized by containing 5-800 ppm by mass of a fluorine-based solvent. Also specifically disclosed is a method for producing a pellicle film, which comprises: a step A wherein a coating film of a solution that contains an amorphous fluoropolymer and a fluorine-based solvent is formed; and a step B wherein the fluorine-based solvent in the coating film is removed. The method for producing a pellicle film is characterized in that 5-800 ppm by mass of the fluorine-based solvent is caused to remain in the coating film in the step B.

Description

TECHNICAL FIELD[0001]The present invention relates to pellicle membranes and processes of manufacturing the same.BACKGROUND ART[0002]The manufacture of semiconductor devices such as LSIs uses lithography technology to form patterns on semiconductor wafers. More specifically, exposure light is directed through a patterned exposure substrate onto a photoresist film deposited on the semiconductor wafer, to transfer the pattern onto the semiconductor wafer. When there are dust particles attached to the exposure substrate, it may result in, for instance, the deformation of the transferred pattern, giving rise to reduced semiconductor device performance or reduced manufacturing yield. Therefore, a pellicle—a dustproof cover that exhibits very high light transmittance—is attached to the surface of the exposure substrate in order to avoid possible attachment of dust particles to the exposure substrate. Even when dust particles are attached to the pellicle, deformation of the transferred pat...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(United States)
IPC IPC(8): G03F1/62
CPCG03F1/62
Inventor KOZEKI, TAKASHI
Owner MITSUI CHEM INC