Compsn. and organic conductive membrane using same, and its mfg. method

Abstract

Provided is a composition in which the viscosity is hardly changed with the passage of time and an organic conductive layer including the composition in order to planarize the surface of a layer formed by an inkjet process and in order to stabilize the properties. A composition according to the present invention contains an organic conductive material and at least one species of solvent, wherein the changing rate of the viscosity thereof is within a range of +-5% when 30 days have passed after the preparation. The solvent preferably contains a glycol medium. An organic conductive layer according to the present invention includes the composition having the above configuration.

Description

technical field [0001] The present invention relates to a composition, an organic conductive film using the composition, a method for producing the same, an organic EL element having the organic conductive film, a method for producing the same, a semiconductor element having the organic conductive film, a method for producing the same, and an electronic device And electronic equipment, specifically, the above-mentioned conductive thin film is used as a conductive part constituting an electrode or a wiring in an electronic circuit or an integrated circuit. The composition of the present invention can be used as a raw material for various coating methods. Among them, when forming an organic conductive film from the composition, the inkjet method is preferably used. Background technique [0002] Conventionally, in the manufacture of wiring structures used in electronic circuits, integrated circuits, etc., photolithography is used, for example. This photolithography method is a...

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Problems solved by technology

[0005] (1) Since the raw material is in the form of a gas, it is difficult to obtain a thin film with uniform film thickness or film quality on the substrate when there are, for example, unevenness on the surface of the substrate on which the thin film is deposited.

[0006] (2) Since the formation speed of the film is slow, the productivity is low

[0007] (3) In the case of the plasma CVD method, a complex and expensive high-frequency generator or vacuum device is required, and the introduction of manufacturing equipment and maintenance management require a lot of cost

[0008] (4) Since the process of photolithography is complicated and the use efficiency of raw materials is low, the manufacturing cost becomes high. In addition, since the resist or etching solution used in this process is formed into a large amount of waste, the processing cost also very high

[0010] (5) As a raw material, gaseous silicon hydride with high toxicity or reactivity is used, so there are difficulties in handling

[0011] (6) In addition, because the raw material is gaseous, it is necessary to seal the vacuum device or piping system, etc.

Generally, the equipment consisting of these vacuum devices or piping systems becomes large, and these equipment also require maintenance costs because they work in a clean room.

[0012] (7) The vacuum device or piping system itself is expensive, and at the same time, in order to form the required film while maintaining its vacuum environment or plasma environment, it consumes too much energy, so the cost of the finished product is high.

[0046] Therefore, it is difficult for conventional compositions to have a stable viscosity, which affects the formation of film patterns by the inkjet method and the resulting device characteristics.

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