LiNbO3/ZnO/diamond multi-layered film structure surface acoustic wave device and its preparing method
A technology of surface acoustic wave devices and diamond films, which is applied to metal material coating processes, coatings, electrical components, etc., can solve problems such as difficulties, film difficulties, and uneven grain size of films, and achieve good crystallinity Effect
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example 1
[0015] ① On a mirror polished silicon substrate, the ratio is 70% Ar: 27% H 2 :3%CH 4 In the atmosphere of mixed gas, under the conditions of microwave power 5000W, deposition chamber pressure 80 Torr, mixed gas flow rate 600sccm and substrate temperature 750°C, deposit for 2 hours;
[0016] ②Adjust the substrate temperature so that the substrate temperature is reduced from 750°C to 600°C within 2 hours; and add oxygen while lowering the substrate temperature, and change the gas ratio to: 10%Ar:86.5%H within 15 minutes 2 : 1.5% O 2 :2%CH 4 ; Co-deposition for 2 hours;
[0017] ③Tempering treatment at 400°C for 4 to 5 hours in an Ar atmosphere to prepare a nano-diamond film with a preferred orientation of the C-axis;
[0018] ④ Use an ultra-high vacuum radio frequency magnetron sputtering system to sputter a layer of extremely thin nano-ZnO film on the surface of the obtained CVD diamond film, with a film grain size of 40nm and a film thickness of 0.12μm. In a pure oxygen ...
example 2
[0021] Repeat the above steps ①-③ to prepare nano-CVD diamond film;
[0022] ④Use an ultra-high vacuum radio frequency magnetron sputtering system to sputter a layer of extremely thin nano-ZnO film on the surface of the obtained CVD diamond film. The grain size of the film is 50nm, and the film thickness is 0.15μm. ℃ temperature, annealing for 1.0 hours, forming a nano-ZnO film with high C-axis preferred orientation,
[0023] ⑤ Using ultra-high vacuum radio frequency magnetron sputtering system, in Ar:O 2 =15:1 atmosphere, substrate temperature 450°C, RF power 55W, DC bias electric field 7V / cm, on the surface of nano-ZnO film with high C-axis preferred orientation, LiNbO with high C-axis preferred orientation 3 film. LiNbO on ZnO nanofilm surface 3 The thin film is a nano film with a grain size of 50 nm and a film thickness of 0.7 μm.
[0024] The present invention increases the nanometer ZnO thin film of one deck high C-axis preferential orientation because: C-axis orient...
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